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	Effect of substrate temperature on sputtered indium-aluminum-zinc oxide films and thin film transistors
	Xu, Weidong; Jiang, Jianfeng; Xu, Sanjin; Zhang, Yu; Xu, Huayong; Han, Lin; Feng, Xianjin
刊名	JOURNAL OF ALLOYS AND COMPOUNDS
	2019
卷号	791页码:773-778
关键词	Amorphous oxide semiconductors IAZO Substrate temperature Thin film transistors
DOI	10.1016/j.jallcom.2019.03.245
URL标识	查看原文
公开日期	[db:dc_date_available]
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/4548109
专题	山东大学
作者单位	Shandong Univ, Sch Microelect, Jinan 250100, Shandong, Peoples R Chi
推荐引用方式 GB/T 7714	Xu, Weidong,Jiang, Jianfeng,Xu, Sanjin,et al. Effect of substrate temperature on sputtered indium-aluminum-zinc oxide films and thin film transistors[J]. JOURNAL OF ALLOYS AND COMPOUNDS,2019,791:773-778.
APA	Xu, Weidong.,Jiang, Jianfeng.,Xu, Sanjin.,Zhang, Yu.,Xu, Huayong.,...&Feng, Xianjin.(2019).Effect of substrate temperature on sputtered indium-aluminum-zinc oxide films and thin film transistors.JOURNAL OF ALLOYS AND COMPOUNDS,791,773-778.
MLA	Xu, Weidong,et al."Effect of substrate temperature on sputtered indium-aluminum-zinc oxide films and thin film transistors".JOURNAL OF ALLOYS AND COMPOUNDS 791(2019):773-778.

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