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	Facile and Fast Deposition of Amorphous TiO2 Film under Atmospheric Pressure and at Room Temperature, and its High Photocatalytic Activity under UV-C Light
	Sun, Zhi-Guang; Li, Xiao-Song; Zhu, Xiaobing; Deng, Xiao-Qing; Chang, Da-Lei; Zhu, Ai-Min
刊名	CHEMICAL VAPOR DEPOSITION
	2014
卷号	20页码:8-13
ISSN号	0948-1907
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/4426283
专题	大连理工大学
作者单位	Dalian Univ Technol, Lab Plasma Phys Chem, Dalian 116024, Peoples R China.
推荐引用方式 GB/T 7714	Sun, Zhi-Guang,Li, Xiao-Song,Zhu, Xiaobing,et al. Facile and Fast Deposition of Amorphous TiO2 Film under Atmospheric Pressure and at Room Temperature, and its High Photocatalytic Activity under UV-C Light[J]. CHEMICAL VAPOR DEPOSITION,2014,20:8-13.
APA	Sun, Zhi-Guang,Li, Xiao-Song,Zhu, Xiaobing,Deng, Xiao-Qing,Chang, Da-Lei,&Zhu, Ai-Min.(2014).Facile and Fast Deposition of Amorphous TiO2 Film under Atmospheric Pressure and at Room Temperature, and its High Photocatalytic Activity under UV-C Light.CHEMICAL VAPOR DEPOSITION,20,8-13.
MLA	Sun, Zhi-Guang,et al."Facile and Fast Deposition of Amorphous TiO2 Film under Atmospheric Pressure and at Room Temperature, and its High Photocatalytic Activity under UV-C Light".CHEMICAL VAPOR DEPOSITION 20(2014):8-13.

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