Fuzzy predictive R2R control to CMP process
Wang L(王亮); Hu JT(胡静涛)
2011
会议名称2011 IEEE International Conference on Computer Science and Automation Engineering, CSAE 2011
会议日期June 10-12, 2011
会议地点Shanghai, China
关键词Chemical mechanical polishing Clustering algorithms Computer science Controllers Industrial applications Mathematical models Polishing Predictive control systems Semiconductor device manufacture Stripping (removal)
页码6-10
中文摘要For chemical mechanical polishing (CMP) process characteristics of nonlinear, time-varying and not easily being in-situ measured, this paper proposes a CMP process fuzzy predictive run-to-run (R2R) controller named FPR2R. CMP T-S fuzzy predictive model is off-line and on-line identified by algorithms of fuzzy clustering and recursive least squares with forgetting factor, thus problem of constructing accurate mathematical model of complicated CMP is solved and error of modeling is reduced. Recipe is calculated by multivariable generalized predictive control (GPC) method, therefore it improves control precision. Simulation results illustrate that proposed CMP FPR2R controller is better than EWMA control scheme about performance, variation in various runs of products is reduced substantially, process drifts and shifts is suppressed significantly. Compared to EWMA, root mean squared error for material removal rate(MRR) is decreased.
收录类别EI
产权排序1
会议主办者IEEE Beijing Section; Pudong New Area Association for Computer; Pudong New Area Science and Technology Development Fund; Tongji University; Xiamen University
会议录Proceedings - 2011 IEEE International Conference on Computer Science and Automation Engineering, CSAE 2011
会议录出版者IEEE Computer Society
会议录出版地Piscataway, NJ
语种英语
ISBN号978-1-4244-8725-7
内容类型会议论文
源URL[http://ir.sia.cn/handle/173321/8358]  
专题沈阳自动化研究所_工业信息学研究室
推荐引用方式
GB/T 7714
Wang L,Hu JT. Fuzzy predictive R2R control to CMP process[C]. 见:2011 IEEE International Conference on Computer Science and Automation Engineering, CSAE 2011. Shanghai, China. June 10-12, 2011.
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