Fuzzy predictive R2R control to CMP process | |
Wang L(王亮); Hu JT(胡静涛) | |
2011 | |
会议名称 | 2011 IEEE International Conference on Computer Science and Automation Engineering, CSAE 2011 |
会议日期 | June 10-12, 2011 |
会议地点 | Shanghai, China |
关键词 | Chemical mechanical polishing Clustering algorithms Computer science Controllers Industrial applications Mathematical models Polishing Predictive control systems Semiconductor device manufacture Stripping (removal) |
页码 | 6-10 |
中文摘要 | For chemical mechanical polishing (CMP) process characteristics of nonlinear, time-varying and not easily being in-situ measured, this paper proposes a CMP process fuzzy predictive run-to-run (R2R) controller named FPR2R. CMP T-S fuzzy predictive model is off-line and on-line identified by algorithms of fuzzy clustering and recursive least squares with forgetting factor, thus problem of constructing accurate mathematical model of complicated CMP is solved and error of modeling is reduced. Recipe is calculated by multivariable generalized predictive control (GPC) method, therefore it improves control precision. Simulation results illustrate that proposed CMP FPR2R controller is better than EWMA control scheme about performance, variation in various runs of products is reduced substantially, process drifts and shifts is suppressed significantly. Compared to EWMA, root mean squared error for material removal rate(MRR) is decreased. |
收录类别 | EI |
产权排序 | 1 |
会议主办者 | IEEE Beijing Section; Pudong New Area Association for Computer; Pudong New Area Science and Technology Development Fund; Tongji University; Xiamen University |
会议录 | Proceedings - 2011 IEEE International Conference on Computer Science and Automation Engineering, CSAE 2011 |
会议录出版者 | IEEE Computer Society |
会议录出版地 | Piscataway, NJ |
语种 | 英语 |
ISBN号 | 978-1-4244-8725-7 |
内容类型 | 会议论文 |
源URL | [http://ir.sia.cn/handle/173321/8358] |
专题 | 沈阳自动化研究所_工业信息学研究室 |
推荐引用方式 GB/T 7714 | Wang L,Hu JT. Fuzzy predictive R2R control to CMP process[C]. 见:2011 IEEE International Conference on Computer Science and Automation Engineering, CSAE 2011. Shanghai, China. June 10-12, 2011. |
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