In situ scanning-tunneling-microscope observation on dissolution of a Cu-20Zr film

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	In situ scanning-tunneling-microscope observation on dissolution of a Cu-20Zr film
	H. B. Lu ; G. Z. Meng ; Y. Li ; F. H. Wang
刊名	Journal of Materials Science & Technology
	2005
卷号	21 期号:3 页码:311-314
关键词	magnetron sputtering film potentiodynamic polarization ECSTM electrochemical stm noble-metal alloys copper corrosion cu(111)
ISSN号	1005-0302
中文摘要	A nanocrystalline coating of Cu-20Zr (in wt pct) was obtained on glass by magnetron sputtering. The corrosion behavior of the Cu-20Zr film in 0.001 mol/L HCI solution was investigated using potentiodynamic polarization and in situ electrochemical scanning-tunneling-microscopy (ECSTM). Results demonstrated that the film exhibits active behavior. Microscopic pitting corrosion and tunneling are caused by localized electrodissolution of Zr atoms and the diffusion of Cu atoms at surface defects.
原文出处	://WOS:000229594400006
公开日期	2012-05-17
内容类型	期刊论文
源URL	[http://ir.imr.ac.cn/handle/321006/40020]
专题	金属研究所_中国科学院金属研究所
推荐引用方式 GB/T 7714	H. B. Lu,G. Z. Meng,Y. Li,et al. In situ scanning-tunneling-microscope observation on dissolution of a Cu-20Zr film[J]. Journal of Materials Science & Technology,2005,21(3):311-314.
APA	H. B. Lu,G. Z. Meng,Y. Li,&F. H. Wang.(2005).In situ scanning-tunneling-microscope observation on dissolution of a Cu-20Zr film.Journal of Materials Science & Technology,21(3),311-314.
MLA	H. B. Lu,et al."In situ scanning-tunneling-microscope observation on dissolution of a Cu-20Zr film".Journal of Materials Science & Technology 21.3(2005):311-314.