FRACTON-ELECTRON INTERACTION - A POSSIBLE ORIGIN OF THE RESISTIVITY MINIMA AT LOW-TEMPERATURES IN METALLIC GLASSES

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	FRACTON-ELECTRON INTERACTION - A POSSIBLE ORIGIN OF THE RESISTIVITY MINIMA AT LOW-TEMPERATURES IN METALLIC GLASSES
	D. C. Tian ; J. X. Li ; Z. H. Zhang
刊名	Physical Review B
	1992
卷号	45 期号:14 页码:8116-8119
关键词	disordered-systems thermal-conductivity percolation clusters amorphous materials nonradiative decay alloys resistance relaxation states
ISSN号	0163-1829
中文摘要	We calculate the temperature dependence of resistivity to second order of the interaction between the conduction electrons (extended) and fractons (excitations in a fractal lattice). The result shows that the resistivity rho varies as [1n(HBAr-omega(F)/kT-HBAR-omega(c))]2 (omega(F) the fraction Debye frequency and omega(c) the phonon-fraction crossover frequency). It is demonstrated that resistivity minima at low temperatures in weak-scattering metallic glasses might be due to a competition between negative temperature coefficients of resistivity (TCR's) resulting from the electron-fracton interaction and a positive TCR from the regular electron-phonon interaction.
原文出处	://WOS:A1992HN47700059
公开日期	2012-04-14
内容类型	期刊论文
源URL	[http://ir.imr.ac.cn/handle/321006/39296]
专题	金属研究所_中国科学院金属研究所
推荐引用方式 GB/T 7714	D. C. Tian,J. X. Li,Z. H. Zhang. FRACTON-ELECTRON INTERACTION - A POSSIBLE ORIGIN OF THE RESISTIVITY MINIMA AT LOW-TEMPERATURES IN METALLIC GLASSES[J]. Physical Review B,1992,45(14):8116-8119.
APA	D. C. Tian,J. X. Li,&Z. H. Zhang.(1992).FRACTON-ELECTRON INTERACTION - A POSSIBLE ORIGIN OF THE RESISTIVITY MINIMA AT LOW-TEMPERATURES IN METALLIC GLASSES.Physical Review B,45(14),8116-8119.
MLA	D. C. Tian,et al."FRACTON-ELECTRON INTERACTION - A POSSIBLE ORIGIN OF THE RESISTIVITY MINIMA AT LOW-TEMPERATURES IN METALLIC GLASSES".Physical Review B 45.14(1992):8116-8119.