Microstructures and mechanical properties of chromium oxide films by arc ion plating

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	Microstructures and mechanical properties of chromium oxide films by arc ion plating
	A. L. Ji ; W. Wang ; G. H. Song ; Q. M. Wang ; C. Sun ; L. S. Wen
刊名	Materials Letters
	2004
卷号	58 期号:14 页码:1993-1998
关键词	Cr2O3 films arc ion plating microstructure mechanical properties chemical-vapor-deposition optical-properties tin films coatings
ISSN号	0167-577X
中文摘要	Chromium oxide (Cr2O3) films were deposited on stainless steel substrate by arc ion plating (AIP) technique. The results show that the flow rate of oxygen and bias voltage affected the microstructure, surface morphology and chemical composition of Cr2O3 films. The hardness of stoichiometric Cr2O3 film obtained at flow oxygen rate of 130 sccm and a bias voltage of -200 V reaches a maximum value of 36 GPa, much higher than that of films obtained by other deposition methods. (C) 2004 Elsevier B.V. All rights reserved.
原文出处	://WOS:000220947500004
公开日期	2012-04-14
内容类型	期刊论文
源URL	[http://ir.imr.ac.cn/handle/321006/35385]
专题	金属研究所_中国科学院金属研究所
推荐引用方式 GB/T 7714	A. L. Ji,W. Wang,G. H. Song,et al. Microstructures and mechanical properties of chromium oxide films by arc ion plating[J]. Materials Letters,2004,58(14):1993-1998.
APA	A. L. Ji,W. Wang,G. H. Song,Q. M. Wang,C. Sun,&L. S. Wen.(2004).Microstructures and mechanical properties of chromium oxide films by arc ion plating.Materials Letters,58(14),1993-1998.
MLA	A. L. Ji,et al."Microstructures and mechanical properties of chromium oxide films by arc ion plating".Materials Letters 58.14(2004):1993-1998.