Effect of negative bias voltage on CrN films deposited by arc ion plating. I. Macroparticles filtration and film-growth characteristics

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	Effect of negative bias voltage on CrN films deposited by arc ion plating. I. Macroparticles filtration and film-growth characteristics
	Q. M. Wang ; K. H. Kim
刊名	Journal of Vacuum Science & Technology A
	2008
卷号	26 期号:5 页码:1258-1266
关键词	chromium nitride films hybrid coating system structure zone model si-n coatings mechanical-properties tin films thin-films pulse bias vacuum evaporation
ISSN号	0734-2101
中文摘要	Chromium nitride (CrN) films were deposited on Si wafers by arc ion plating (AIP) at various negative bias voltages and several groups of N-2/Ar gas flux ratios and chamber gas pressures. The authors systematically investigated the influence of negative bias voltage on the synthesis, composition, microstructure, and properties of the AIP CrN films. In this part (Part I), the investigations were mainly focused on the macroparticle distributions and film-growth characteristics. The results showed that macroparticle densities on the film surfaces decreased greatly by applying negative bias voltage, which can be affected by partial pressure of N-2 and Ar gases. From the statistical analysis of the experimental results, they proposed a new hybrid mechanism of ion bombardment and electrical repulsion. Also, the growth of the AIP CrN films was greatly altered by applying negative bias voltage. By increasing the bias voltage, the film surfaces became much smoother and the films evolved from apparent columnar microstructures to an equiaxed microstructure. The impinging high-energy Cr ions accelerated by negative bias voltages were deemed the inherent reason for the evolution of growth characteristics. (c) 2008 American Vacuum Society.
原文出处	://WOS:000259296000025
公开日期	2012-04-13
内容类型	期刊论文
源URL	[http://ir.imr.ac.cn/handle/321006/33144]
专题	金属研究所_中国科学院金属研究所
推荐引用方式 GB/T 7714	Q. M. Wang,K. H. Kim. Effect of negative bias voltage on CrN films deposited by arc ion plating. I. Macroparticles filtration and film-growth characteristics[J]. Journal of Vacuum Science & Technology A,2008,26(5):1258-1266.
APA	Q. M. Wang,&K. H. Kim.(2008).Effect of negative bias voltage on CrN films deposited by arc ion plating. I. Macroparticles filtration and film-growth characteristics.Journal of Vacuum Science & Technology A,26(5),1258-1266.
MLA	Q. M. Wang,et al."Effect of negative bias voltage on CrN films deposited by arc ion plating. I. Macroparticles filtration and film-growth characteristics".Journal of Vacuum Science & Technology A 26.5(2008):1258-1266.