Low energy ion beam assisted deposition of biaxially aligned YSZ and CeO2/YSZ films on r-plane sapphire
Mu, HC ; Ren, CX ; Jiang, BY ; Yu, YH ; Luo, EZ ; Wilson, ZH
刊名SURFACE & COATINGS TECHNOLOGY
2000
卷号124期号:1页码:61-65
关键词PULSED-LASER DEPOSITION YBA2CU3O7 THIN-FILMS LARGE-AREA BUFFER LAYERS BOMBARDMENT ORIENTATION GROWTH
ISSN号0257-8972
通讯作者Mu, HC, Chinese Acad Sci, Shanghai Inst Met, Ion Beam Lab, 865 Changning Rd, Shanghai 200050, Peoples R China
学科主题Materials Science, Coatings & Films; Physics, Applied
收录类别SCI
语种英语
公开日期2012-03-24
内容类型期刊论文
源URL[http://ir.sim.ac.cn/handle/331004/95878]  
专题上海微系统与信息技术研究所_功能材料与器件_期刊论文
推荐引用方式
GB/T 7714
Mu, HC,Ren, CX,Jiang, BY,et al. Low energy ion beam assisted deposition of biaxially aligned YSZ and CeO2/YSZ films on r-plane sapphire[J]. SURFACE & COATINGS TECHNOLOGY,2000,124(1):61-65.
APA Mu, HC,Ren, CX,Jiang, BY,Yu, YH,Luo, EZ,&Wilson, ZH.(2000).Low energy ion beam assisted deposition of biaxially aligned YSZ and CeO2/YSZ films on r-plane sapphire.SURFACE & COATINGS TECHNOLOGY,124(1),61-65.
MLA Mu, HC,et al."Low energy ion beam assisted deposition of biaxially aligned YSZ and CeO2/YSZ films on r-plane sapphire".SURFACE & COATINGS TECHNOLOGY 124.1(2000):61-65.
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