Lead-zirconate-titanate thin films deposited on silicon using a novel technique at low temperature

	Lead-zirconate-titanate thin films deposited on silicon using a novel technique at low temperature
	Zeng, JM ; Zhang, M ; Song, ZT ; Wang, LW ; Li, JH ; Li, K ; Lin, CL
刊名	APPLIED SURFACE SCIENCE
	1999
卷号	148 期号:3-4 页码:137-141
ISSN号	0169-4332
通讯作者	Zeng, JM, Chinese Acad Sci, Shanghai Inst Met, Natl Lab Funct Mat Informat, 865 Changning Rd, Shanghai 200050, Peoples R China
学科主题	Chemistry, Physical; Materials Science, Coatings & Films; Physics, Applied; Physics, Condensed Matter
收录类别	SCI
语种	英语
公开日期	2012-03-25
内容类型	期刊论文
源URL	[http://ir.sim.ac.cn/handle/331004/99060]
专题	上海微系统与信息技术研究所_功能材料与器件_期刊论文（1999年以前)
推荐引用方式 GB/T 7714	Zeng, JM,Zhang, M,Song, ZT,et al. Lead-zirconate-titanate thin films deposited on silicon using a novel technique at low temperature[J]. APPLIED SURFACE SCIENCE,1999,148(3-4):137-141.
APA	Zeng, JM.,Zhang, M.,Song, ZT.,Wang, LW.,Li, JH.,...&Lin, CL.(1999).Lead-zirconate-titanate thin films deposited on silicon using a novel technique at low temperature.APPLIED SURFACE SCIENCE,148(3-4),137-141.
MLA	Zeng, JM,et al."Lead-zirconate-titanate thin films deposited on silicon using a novel technique at low temperature".APPLIED SURFACE SCIENCE 148.3-4(1999):137-141.