Aggregation and out diffusion of iron atoms for Fe ion implanted silica films

	Aggregation and out diffusion of iron atoms for Fe ion implanted silica films
	Ding, XZ ; Chiah, MF ; Cheung, WY ; Wong, SP ; Xu, JB ; Wilson, IH ; Wang, HM ; Chen, LZ ; Liu, XH
刊名	JOURNAL OF APPLIED PHYSICS
	1999
卷号	86 期号:5 页码:2550-2554
关键词	OPTICAL-PROPERTIES PARTICLES GLASS THIN SIZE
ISSN号	0021-8979
通讯作者	Ding, XZ, Chinese Acad Sci, Shanghai Inst Met, Ion Beam Lab, 865 Chang Ning Rd, Shanghai 200050, Peoples R China
学科主题	Physics, Applied
收录类别	SCI
语种	英语
公开日期	2012-03-25
内容类型	期刊论文
源URL	[http://ir.sim.ac.cn/handle/331004/99044]
专题	上海微系统与信息技术研究所_功能材料与器件_期刊论文（1999年以前)
推荐引用方式 GB/T 7714	Ding, XZ,Chiah, MF,Cheung, WY,et al. Aggregation and out diffusion of iron atoms for Fe ion implanted silica films[J]. JOURNAL OF APPLIED PHYSICS,1999,86(5):2550-2554.
APA	Ding, XZ.,Chiah, MF.,Cheung, WY.,Wong, SP.,Xu, JB.,...&Liu, XH.(1999).Aggregation and out diffusion of iron atoms for Fe ion implanted silica films.JOURNAL OF APPLIED PHYSICS,86(5),2550-2554.
MLA	Ding, XZ,et al."Aggregation and out diffusion of iron atoms for Fe ion implanted silica films".JOURNAL OF APPLIED PHYSICS 86.5(1999):2550-2554.