High energy xenon ion beam assisted deposition of TiN film and its industrial application

	High energy xenon ion beam assisted deposition of TiN film and its industrial application
	Wang,X ; Yang,GQ ; Liu,XG ; Zheng,ZH ; Huang,W ; Zou,SC ; Martin,PJ ; Bendavid,A ; Han,JG ; Yoo,JS
刊名	JOURNAL OF MATERIALS SCIENCE
	1996
卷号	31 期号:2 页码:363-369
ISSN号	0022-2461
通讯作者	Wang, X, CHINESE ACAD SCI, SHANGHAI INST MET, ION BEAM LAB, SHANGHAI 200050, PEOPLES R CHINA
学科主题	Materials Science ; Multidisciplinary
收录类别	SCI
公开日期	2012-03-25
内容类型	期刊论文
源URL	[http://ir.sim.ac.cn/handle/331004/98754]
专题	上海微系统与信息技术研究所_功能材料与器件_期刊论文（1999年以前)
推荐引用方式 GB/T 7714	Wang,X,Yang,GQ,Liu,XG,et al. High energy xenon ion beam assisted deposition of TiN film and its industrial application[J]. JOURNAL OF MATERIALS SCIENCE,1996,31(2):363-369.
APA	Wang,X.,Yang,GQ.,Liu,XG.,Zheng,ZH.,Huang,W.,...&Yoo,JS.(1996).High energy xenon ion beam assisted deposition of TiN film and its industrial application.JOURNAL OF MATERIALS SCIENCE,31(2),363-369.
MLA	Wang,X,et al."High energy xenon ion beam assisted deposition of TiN film and its industrial application".JOURNAL OF MATERIALS SCIENCE 31.2(1996):363-369.