Thermal diffusion of nitrogen into ZnO film deposited on InN/sapphire substrate by metal organic chemical vapor deposition

	Thermal diffusion of nitrogen into ZnO film deposited on InN/sapphire substrate by metal organic chemical vapor deposition
	Shi K (Shi K.) ; Zhang PF (Zhang P. F.) ; Wei HY (Wei H. Y.) ; Jiao CM (Jiao C. M.) ; Jin P (Jin P.) ; Liu XL (Liu X. L.) ; Yang SY (Yang S. Y.) ; Zhu QS (Zhu Q. S.) ; Wang ZG (Wang Z. G.)
刊名	journal of applied physics
	2011
卷号	110 期号:11 页码:113509
学科主题	半导体材料
公开日期	2012-02-22
内容类型	期刊论文
源URL	[http://ir.semi.ac.cn/handle/172111/22932]
专题	半导体研究所_中科院半导体材料科学重点实验室
推荐引用方式 GB/T 7714	Shi K ,Zhang PF ,Wei HY ,et al. Thermal diffusion of nitrogen into ZnO film deposited on InN/sapphire substrate by metal organic chemical vapor deposition[J]. journal of applied physics,2011,110(11):113509.
APA	Shi K .,Zhang PF .,Wei HY .,Jiao CM .,Jin P .,...&Wang ZG .(2011).Thermal diffusion of nitrogen into ZnO film deposited on InN/sapphire substrate by metal organic chemical vapor deposition.journal of applied physics,110(11),113509.
MLA	Shi K ,et al."Thermal diffusion of nitrogen into ZnO film deposited on InN/sapphire substrate by metal organic chemical vapor deposition".journal of applied physics 110.11(2011):113509.