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	New insights into the surface relaxation and oxidation of chalcopyrite exposed to O-2 and H2O: A first-principles DFT study
	Wei, Zhenlun; Li, Yubiao*; Gao, Huimin; Zhu, Yangge; Qian, Gujie; Yao, Jun
刊名	Applied Surface Science
	2019
卷号	492页码:89-98
关键词	Chalcopyrite Surface relaxation Oxidation mechanism DFT
ISSN号	0169-4332
DOI	10.1016/j.apsusc.2019.06.191
URL标识	查看原文
WOS记录号	WOS:000489699700012
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/3400172
专题	武汉理工大学
作者单位	1.[Wei, Zhenlun 2.Gao, Huimin 3.Li, Yubiao] Wuhan Univ Technol, Sch Resources & Environm Engn, Wuhan 430070, Hubei, Peoples R China.
推荐引用方式 GB/T 7714	Wei, Zhenlun,Li, Yubiao*,Gao, Huimin,et al. New insights into the surface relaxation and oxidation of chalcopyrite exposed to O-2 and H2O: A first-principles DFT study[J]. Applied Surface Science,2019,492:89-98.
APA	Wei, Zhenlun,Li, Yubiao*,Gao, Huimin,Zhu, Yangge,Qian, Gujie,&Yao, Jun.(2019).New insights into the surface relaxation and oxidation of chalcopyrite exposed to O-2 and H2O: A first-principles DFT study.Applied Surface Science,492,89-98.
MLA	Wei, Zhenlun,et al."New insights into the surface relaxation and oxidation of chalcopyrite exposed to O-2 and H2O: A first-principles DFT study".Applied Surface Science 492(2019):89-98.

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