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High‐speed heteroepitaxial growth of 3C‐SiC (111) thick films on Si (110) by laser chemical vapor deposition
Sun, Qingyun; Zhu, Peipei; Xu, Qingfang; Tu, Rong; Zhang, Song*; Shi, Ji; Li, Haiwen; Zhang, Lianmeng; Goto, Takashi; Yan, Jiasheng
刊名Journal of the American Ceramic Society
2018
卷号101期号:3页码:1048-1057
关键词3C‐SiC (111) heteroepitaxial growth laser CVD orientation Si (110)
ISSN号1551-2916
DOI10.1111/jace.15260
URL标识查看原文
WOS记录号WOS:000419096700011
内容类型期刊论文
URI标识http://www.corc.org.cn/handle/1471x/3380290
专题武汉理工大学
作者单位1.[Tu, Rong
2.Xu, Qingfang
3.Sun, Qingyun
4.Zhu, Peipei
5.Zhang, Song
6.Goto, Takashi
7.Zhang, Lianmeng
8.Shi, Ji
9.Li, Haiwen
10.Yan, Jiasheng] Wuhan Univ Technol, State Key Lab Adv Technol Mat Synth & Proc, Wuhan, Hubei, Peoples R China.
推荐引用方式
GB/T 7714
Sun, Qingyun,Zhu, Peipei,Xu, Qingfang,et al. High‐speed heteroepitaxial growth of 3C‐SiC (111) thick films on Si (110) by laser chemical vapor deposition[J]. Journal of the American Ceramic Society,2018,101(3):1048-1057.
APA Sun, Qingyun.,Zhu, Peipei.,Xu, Qingfang.,Tu, Rong.,Zhang, Song*.,...&Li, Shusen.(2018).High‐speed heteroepitaxial growth of 3C‐SiC (111) thick films on Si (110) by laser chemical vapor deposition.Journal of the American Ceramic Society,101(3),1048-1057.
MLA Sun, Qingyun,et al."High‐speed heteroepitaxial growth of 3C‐SiC (111) thick films on Si (110) by laser chemical vapor deposition".Journal of the American Ceramic Society 101.3(2018):1048-1057.
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