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Band gap engineering of MnO2 through in situ Al-doping for applicable pseudocapacitors
Li, Tianqi; Wu, Jiabin; Xiao, Xu; Zhang, Bingyan; Hu, Zhimi; Zhou, Jun; Yang, Peihua; Chen, Xun; Wang, Bo; Huang, Liang*
刊名RSC Advances
2016
卷号6期号:17页码:13914-13919
ISSN号2046-2069
DOI10.1039/c5ra26830c
URL标识查看原文
WOS记录号WOS:000369639400038;EI:20160701924166
内容类型期刊论文
URI标识http://www.corc.org.cn/handle/1471x/3373815
专题武汉理工大学
作者单位1.[Zhang, Bingyan
2.Huang, Liang
3.Wang, Bo
4.Zhou, Jun
5.Yang, Peihua
6.Chen, Xun
7.Xiao, Xu
8.Li, Tianqi
9.Hu, Zhimi] Huazhong Univ Sci & Technol, Sch Opt & Elect Informat, Wuhan Natl Lab Optoelect, Wuhan 430074, Peoples R China.
推荐引用方式
GB/T 7714
Li, Tianqi,Wu, Jiabin,Xiao, Xu,et al. Band gap engineering of MnO2 through in situ Al-doping for applicable pseudocapacitors[J]. RSC Advances,2016,6(17):13914-13919.
APA Li, Tianqi.,Wu, Jiabin.,Xiao, Xu.,Zhang, Bingyan.,Hu, Zhimi.,...&Huang, Liang*.(2016).Band gap engineering of MnO2 through in situ Al-doping for applicable pseudocapacitors.RSC Advances,6(17),13914-13919.
MLA Li, Tianqi,et al."Band gap engineering of MnO2 through in situ Al-doping for applicable pseudocapacitors".RSC Advances 6.17(2016):13914-13919.
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