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	Fabrication of p-n heterostructure ZnO/Si moth-eye structures: Antireflection, enhanced charge separation and photocatalytic properties
	Zeng, Yu; Chen, XiFang; Yi, Zao*; Yi, Yougen*; Xu, Xibin*
刊名	Applied Surface Science
	2018
卷号	441页码:40-48
关键词	ZnO nanorods Wet etching Hydrothermal method Heterojunction Moth-eye structure
ISSN号	0169-4332
DOI	10.1016/j.apsusc.2018.02.002
URL标识	查看原文
WOS记录号	WOS:000427816400005;EI:20180704781055
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/3317331
专题	中南大学
作者单位	1.[Zeng, Yu 2.Chen, XiFang 3.Yi, Zao] Southwest Univ Sci & Technol, Joint Lab Extreme Condit Matter Properties, Mianyang 621010, Peoples R China.
推荐引用方式 GB/T 7714	Zeng, Yu,Chen, XiFang,Yi, Zao*,et al. Fabrication of p-n heterostructure ZnO/Si moth-eye structures: Antireflection, enhanced charge separation and photocatalytic properties[J]. Applied Surface Science,2018,441:40-48.
APA	Zeng, Yu,Chen, XiFang,Yi, Zao*,Yi, Yougen*,&Xu, Xibin*.(2018).Fabrication of p-n heterostructure ZnO/Si moth-eye structures: Antireflection, enhanced charge separation and photocatalytic properties.Applied Surface Science,441,40-48.
MLA	Zeng, Yu,et al."Fabrication of p-n heterostructure ZnO/Si moth-eye structures: Antireflection, enhanced charge separation and photocatalytic properties".Applied Surface Science 441(2018):40-48.

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