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	Unveiling the competitive role of etching in graphene growth during chemical vapor deposition
	Chen, Shuai; Junfeng GAO; Srinivasan, Bharathi M.; Zhang, Gang; Sorkin, Viacheslav; Hariharaputran, Ramanarayan; Zhang, Yong-Wei
刊名	2D MATERIALS
	2019
卷号	6页码:015031
URL标识	查看原文
WOS记录号	[DB:DC_IDENTIFIER_WOSID]
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/3217676
专题	大连理工大学
作者单位	1.ASTAR, Inst High Performance Comp, Singapore, Singapore. 2.ASTAR, Inst High Performance Comp, Singapore, Singapore 3.ASTAR, Inst High Performance Comp, Singapore, Singapore.
推荐引用方式 GB/T 7714	Chen, Shuai,Junfeng GAO,Srinivasan, Bharathi M.,et al. Unveiling the competitive role of etching in graphene growth during chemical vapor deposition[J]. 2D MATERIALS,2019,6:015031.
APA	Chen, Shuai.,Junfeng GAO.,Srinivasan, Bharathi M..,Zhang, Gang.,Sorkin, Viacheslav.,...&Zhang, Yong-Wei.(2019).Unveiling the competitive role of etching in graphene growth during chemical vapor deposition.2D MATERIALS,6,015031.
MLA	Chen, Shuai,et al."Unveiling the competitive role of etching in graphene growth during chemical vapor deposition".2D MATERIALS 6(2019):015031.

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