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	Nano-Patterns of Photoresist Fabricated by Ultraviolet Lithography Technology
	Cheng E; Tang Suzhou; Li Chen; Zou Helin; Wei Qiang
刊名	Journal of nanoscience and nanotechnology
	2020
卷号	20页码:2508-2513
ISSN号	1533-4899
URL标识	查看原文
WOS记录号	[DB:DC_IDENTIFIER_WOSID]
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/3214811
专题	大连理工大学
作者单位	1.School of Mechanical Engineering, Hebei University of Technology, Tianjin 300401, China. 2.College of Packaging and Printing Engineering, Tianjin University of Science and Technology, Tianjin 300222, China. 3.Key Laboratory for Micro/Nano Technology and Systems of Liaoning Province, Dalian University of Technology, Dalian 116024, China.
推荐引用方式 GB/T 7714	Cheng E,Tang Suzhou,Li Chen,et al. Nano-Patterns of Photoresist Fabricated by Ultraviolet Lithography Technology[J]. Journal of nanoscience and nanotechnology,2020,20:2508-2513.
APA	Cheng E,Tang Suzhou,Li Chen,Zou Helin,&Wei Qiang.(2020).Nano-Patterns of Photoresist Fabricated by Ultraviolet Lithography Technology.Journal of nanoscience and nanotechnology,20,2508-2513.
MLA	Cheng E,et al."Nano-Patterns of Photoresist Fabricated by Ultraviolet Lithography Technology".Journal of nanoscience and nanotechnology 20(2020):2508-2513.

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