Low atomic number silicon nitride films for transmission electron  microscopy

	Low atomic number silicon nitride films for transmission electron microscopy
	Li JF(李俊峰); Liu RW(刘瑞文); Shang HP(尚海平); Chen DP(陈大鹏); Wang WB(王玮冰); Fu JY(傅剑宇); Xiong WJ(熊文娟); Wang WW(王文武)
刊名	Materials Science in Semiconductor Processing
	2018-08-29
文献子类	期刊论文
内容类型	期刊论文
源URL	[http://159.226.55.107/handle/172511/19190]
专题	微电子研究所_集成电路先导工艺研发中心
作者单位	中国科学院微电子研究所
推荐引用方式 GB/T 7714	Li JF,Liu RW,Shang HP,et al. Low atomic number silicon nitride films for transmission electron microscopy[J]. Materials Science in Semiconductor Processing,2018.
APA	李俊峰.,刘瑞文.,尚海平.,陈大鹏.,王玮冰.,...&王文武.(2018).Low atomic number silicon nitride films for transmission electron microscopy.Materials Science in Semiconductor Processing.
MLA	李俊峰,et al."Low atomic number silicon nitride films for transmission electron microscopy".Materials Science in Semiconductor Processing (2018).