Optimized fabrication of wafer-level Si waveguides based on 200mm CMOS platform

	Optimized fabrication of wafer-level Si waveguides based on 200mm CMOS platform
	Li ZH(李志华); Li B(李彬); Tang B(唐波); Zhang P(张鹏); Yu JZ(余金中); Liu XY(刘新宇)
刊名	Optik
	2018-11-14
文献子类	期刊论文
内容类型	期刊论文
源URL	[http://159.226.55.107/handle/172511/19078]
专题	微电子研究所_集成电路先导工艺研发中心
作者单位	中国科学院微电子研究所
推荐引用方式 GB/T 7714	Li ZH,Li B,Tang B,et al. Optimized fabrication of wafer-level Si waveguides based on 200mm CMOS platform[J]. Optik,2018.
APA	Li ZH,Li B,Tang B,Zhang P,Yu JZ,&Liu XY.(2018).Optimized fabrication of wafer-level Si waveguides based on 200mm CMOS platform.Optik.
MLA	Li ZH,et al."Optimized fabrication of wafer-level Si waveguides based on 200mm CMOS platform".Optik (2018).