亚波长极紫外金属透射光栅及其制作方法
李海亮; 谢常青; 刘明; 李冬梅; 史丽娜; 朱效立
2016-09-13
著作权人中国科学院微电子研究所
专利号US9442230
国家美国
文献子类发明专利
英文摘要

A method of manufacturing a sub-wavelength extreme ultraviolet metal transmission grating is disclosed. In one aspect, the method comprises forming a silicon nitride self-supporting film window on a back surface of a silicon-based substrate having both surfaces polished, then spin-coating a silicon nitride film on a front surface of the substrate with an electron beam resist HSQ. Then, performing electron beam direct writing exposure on the HSQ, developing and fixing to form a plurality of grating line patterns and a ring pattern surrounding the grating line patterns. Then depositing a chrome material on the front surface of the substrate through magnetron sputtering. Then, removing the chrome material inside the ring pattern. Then, growing a gold material on the front surface of the substrate through atomic layer deposition. Lastly, removing the gold material on the chrome material outside the ring pattern as well as on and between the grating line patterns, thereby only retaining the gold material on sidewalls of the grating line patterns.

公开日期2014-06-26
申请日期2011-09-20
语种中文
内容类型专利
源URL[http://159.226.55.106/handle/172511/16577]  
专题微电子研究所_微电子器件与集成技术重点实验室
作者单位中国科学院微电子研究所
推荐引用方式
GB/T 7714
李海亮,谢常青,刘明,等. 亚波长极紫外金属透射光栅及其制作方法. US9442230. 2016-09-13.
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