Investigation on the surface topography of amorphous alloys implanted with helium ions

	Investigation on the surface topography of amorphous alloys implanted with helium ions
	Hou, MD; Liu, J; Zhang, QX; Wang, ZG; Sun, YM; Zhu, ZY; Jin, YF; Liu, G; Liu, C; Wang, ZG
	2003
页码	377-384
英文摘要	The surface deformations induced by helium ion bombardment at the energy of 40keV and 60keV to a dose range of (1.0-4.0)x10(18) ions/cm(2) have been investigated for many kinds of amorphous alloys. The changes in surface topography after irradiation were observed by using a scanning electron microscope. The diameter of blister and the thickness of exfoliated blister lids were measured. The results showed that many kinds of surface topography characteristics appeared for different doses, energies and amorphous alloys, such as flaking, blistering, exfoliation, blister rupture, second-generation blistering and porous structure. The dependence of surface damage modes and the critical dose for onset of blistering and flaking on material sort and ion energy was discussed.
会议录	MATERIALS FOR ADVANCED ENERGY SYSTEMS AND FISSION AND FUSION ENGINEERING, PROCEEDINGS
会议录出版者	WORLD SCIENTIFIC PUBL CO PTE LTD
会议录出版地	PO BOX 128 FARRER RD, SINGAPORE 9128, SINGAPORE
语种	英语
WOS研究方向	Materials Science ; Nuclear Science & Technology
WOS记录号	WOS:000185511700046
内容类型	会议论文
源URL	[http://119.78.100.186/handle/113462/57997]
专题	中国科学院近代物理研究所
通讯作者	Hou, MD
作者单位	Chinese Acad Sci, Inst Modern Phys, Lanzhou 730000, Peoples R China
推荐引用方式 GB/T 7714	Hou, MD,Liu, J,Zhang, QX,et al. Investigation on the surface topography of amorphous alloys implanted with helium ions[C]. 见:.