Extreme ultraviolet narrow band emission from electron cyclotron resonance plasmas

doi:10.1063/1.2814258

	Extreme ultraviolet narrow band emission from electron cyclotron resonance plasmas
	Zhao, H. Y.1,2; Zhao, H. W.1; Sun, L. T.1; Zhang, X. Z.1; Wang, H.1 ; Ma, B. H.1; Li, X. X.1; Zhu, Y. H.1; Sheng, L. S.3; Zhang, G. B.3
	2008-02
卷号	79
期号	2
DOI	10.1063/1.2814258
英文摘要	Extreme ultraviolet lithography (EUVL) is considered as the most promising solution at and below dynamic random access memory 32 nm half pitch among the next generation lithography, and EUV light sources with high output power and sufficient lifetime are crucial for the realization of EUVL. However, there is no EUV light source completely meeting the requirements for the commercial application in lithography yet. Therefore, ECR plasma is proposed as a novel concept EUV light source. In order to investigate the feasibility of ECR plasma as a EUV light source, the narrow band EUV power around 13.5 nm emitted by two highly charged ECR ion sources - LECR2M and SECRAL - was measured with a calibrated EUV power measurement tool. Since the emission lines around 13.5 nm can be attributed to the 4d-5p transitions of Xe XI or the 4d-4f unresolved transition array of Sn VIII-XIII, xenon plasma was investigated. The dependence of the EUV throughput and the corresponding conversion efficiency on the parameters of the ion source, such as the rf power and the magnetic confinement configurations, were preliminarily studied. (C) 2008 American Institute of Physics.
会议录	REVIEW OF SCIENTIFIC INSTRUMENTS
会议录出版者	AMER INST PHYSICS
会议录出版地	CIRCULATION & FULFILLMENT DIV, 2 HUNTINGTON QUADRANGLE, STE 1 N O 1, MELVILLE, NY 11747-4501 USA
语种	英语
WOS研究方向	Instruments & Instrumentation ; Physics
WOS记录号	WOS:000254194800183
内容类型	会议论文
源URL	[http://119.78.100.186/handle/113462/57532]
专题	中国科学院近代物理研究所
通讯作者	Zhao, H. Y.
作者单位	1.Chinese Acad Sci, Inst Modern Phys, Lanzhou 730000, Peoples R China 2.Grad Univ, Chinese Acad Sci, Beijing 100049, Peoples R China 3.Univ Sci & Technol China, Hefei 230026, Peoples R China
推荐引用方式 GB/T 7714	Zhao, H. Y.,Zhao, H. W.,Sun, L. T.,et al. Extreme ultraviolet narrow band emission from electron cyclotron resonance plasmas[C]. 见:.