Formation of CNx thin films by reactive pulsed laser deposition assisted by electron cyclotron resonance microwave discharge

	Formation of CNx thin films by reactive pulsed laser deposition assisted by electron cyclotron resonance microwave discharge
	Shi, W ; Wu, JD ; Sun, J ; Ling, H ; Ying, ZF ; Ding, XM ; Zhou, ZY ; Li, FM
刊名	APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
	2001-11-01
卷号	73 页码:605-608
ISSN号	0947-8396
英文摘要	Amorphous carbon nitride thin films were synthesized by pulsed laser deposition combined with electron cyclotron resonance (ECR) microwave discharge in nitrogen gas. The ECR discharge supplies active nitrogen species in the deposition environment and to the growing film surface, enhancing the film growth in complex processes accompanied by chemical reaction. The synthesized films were characterized by Rutherford backscattering spectroscopy (RBS), X-ray photoelectron spectroscopy (XPS), Fourier-transform infrared spectroscopy (FTIR), and Raman spectroscopy. The films were determined to consist purely of carbon and nitrogen with a nitrogen concentration of 42%, and have a thickness of 550nm over which carbon and nitrogen are well distributed. Structural characterizations based on XPS, FTIR and Raman analysis showed that these films appear to contain several bonding configurations between carbon and nitrogen with a small amount of C drop N bonds compared with other bonding states.
WOS关键词	CARBON NITRIDE FILMS ; AMORPHOUS-CARBON ; VAPOR-DEPOSITION ; PLASMA ; BEAM ; MICROSTRUCTURE ; TEMPERATURE ; PRESSURE ; ABLATION ; SOLIDS
WOS研究方向	Materials Science ; Physics
语种	英语
出版者	SPRINGER-VERLAG
WOS记录号	WOS:000171991200013
内容类型	期刊论文
源URL	[http://119.78.100.186/handle/113462/37097]
专题	中国科学院近代物理研究所
通讯作者	Wu, JD
作者单位	1.Fudan Univ, State Key Lab Mat Modificat Laser Ion & Electron, Shanghai 200433, Peoples R China 2.Fudan Univ, Dept Opt Sci & Engn, Shanghai 200433, Peoples R China 3.Fudan Univ, Dept Phys, Shanghai 200433, Peoples R China 4.Fudan Univ, State Key Lab Appl Surface Phys, Shanghai 200433, Peoples R China 5.Fudan Univ, Inst Modern Phys, Shanghai 200433, Peoples R China
推荐引用方式 GB/T 7714	Shi, W,Wu, JD,Sun, J,et al. Formation of CNx thin films by reactive pulsed laser deposition assisted by electron cyclotron resonance microwave discharge[J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING,2001,73:605-608.
APA	Shi, W.,Wu, JD.,Sun, J.,Ling, H.,Ying, ZF.,...&Li, FM.(2001).Formation of CNx thin films by reactive pulsed laser deposition assisted by electron cyclotron resonance microwave discharge.APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING,73,605-608.
MLA	Shi, W,et al."Formation of CNx thin films by reactive pulsed laser deposition assisted by electron cyclotron resonance microwave discharge".APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING 73(2001):605-608.