| NUMERICAL SIMULATION OF POLYSILICON DEPOSITION CHARACTERISTICS IN CHEMICAL VAPOR DEPOSITION PROCESS | |
| An, Lisha; Yang, Zhe; Liu, Yingwen; Gao, Bo | |
| 刊名 | THERMAL SCIENCE
 |
| 2018 | |
| 卷号 | 22页码:S719-S727 |
| 关键词 | polycrystalline silicon chemical vapor deposition deposition characteristics |
| ISSN号 | 0354-9836 |
| URL标识 | 查看原文 |
| 内容类型 | 期刊论文 |
| URI标识 | http://www.corc.org.cn/handle/1471x/2831378 |
| 专题 | 西安交通大学 |
| 推荐引用方式 GB/T 7714 | An, Lisha,Yang, Zhe,Liu, Yingwen,et al. NUMERICAL SIMULATION OF POLYSILICON DEPOSITION CHARACTERISTICS IN CHEMICAL VAPOR DEPOSITION PROCESS[J]. THERMAL SCIENCE,2018,22:S719-S727. |
| APA | An, Lisha,Yang, Zhe,Liu, Yingwen,&Gao, Bo.(2018).NUMERICAL SIMULATION OF POLYSILICON DEPOSITION CHARACTERISTICS IN CHEMICAL VAPOR DEPOSITION PROCESS.THERMAL SCIENCE,22,S719-S727. |
| MLA | An, Lisha,et al."NUMERICAL SIMULATION OF POLYSILICON DEPOSITION CHARACTERISTICS IN CHEMICAL VAPOR DEPOSITION PROCESS".THERMAL SCIENCE 22(2018):S719-S727. |
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