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Direct Observations of Nanofilament Evolution in Switching Processes in HfO2-Based Resistive Random Access Memory by In Situ TEM Studies
Li, Chao ; Gao, Bin ; Yao, Yuan ; Guan, Xiangxiang ; Shen, Xi ; Wang, Yanguo ; Huang, Peng ; Liu, Lifeng ; Liu, Xiaoyan ; Li, Junjie ; Gu, Changzhi ; Kang, Jinfeng ; Yu, Richeng
刊名ADVANCED MATERIALS
2017
关键词ELECTROLYTE-BASED RERAM CONDUCTIVE FILAMENTS MEMRISTOR RRAM HOLOGRAPHY OPERATIONS RESISTANCE CHANNELS DEVICES MODEL
DOI10.1002/adma.201602976
英文摘要Resistive switching processes in HfO2 are studied by electron holography and in situ energy-filtered imaging. The results show that oxygen vacancies are gradually generated in the oxide layer under ramped electrical bias, and finally form several conductive channels connecting the two electrodes. It also shows that the switching process occurs at the top interface of the hafnia layer.; SCI(E); ARTICLE; 10; 29
语种英语
内容类型期刊论文
源URL[http://ir.pku.edu.cn/handle/20.500.11897/474608]  
专题信息科学技术学院
推荐引用方式
GB/T 7714
Li, Chao,Gao, Bin,Yao, Yuan,et al. Direct Observations of Nanofilament Evolution in Switching Processes in HfO2-Based Resistive Random Access Memory by In Situ TEM Studies[J]. ADVANCED MATERIALS,2017.
APA Li, Chao.,Gao, Bin.,Yao, Yuan.,Guan, Xiangxiang.,Shen, Xi.,...&Yu, Richeng.(2017).Direct Observations of Nanofilament Evolution in Switching Processes in HfO2-Based Resistive Random Access Memory by In Situ TEM Studies.ADVANCED MATERIALS.
MLA Li, Chao,et al."Direct Observations of Nanofilament Evolution in Switching Processes in HfO2-Based Resistive Random Access Memory by In Situ TEM Studies".ADVANCED MATERIALS (2017).
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