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	Fabrication of silicon hierarchical nanopillar arrays based on nanosphere lithography
	Su, Zongming ; Zhang, Xiao-Sheng ; Hu, Wei ; Liu, Wen ; Han, Mengdi ; Zhang, Haixia
	2014
英文摘要	A fabrication process of silicon hierarchical nanopillar arrays (NPAs) based on the self-assembled colloid particle monolayer is presented. Using colloid particles assembled by the evaporation-induced method as masks, well-ordered silicon NPAs were fabricated by assessing the deep reactive ion etching process. After the optimisation of the cycles of etching and passivation steps, double-layer hierarchical NPAs were achieved simultaneously. Systematic analysis and experiments were conducted to investigate the transition from well-ordered silicon NPAs to silicon hierarchical NPAs. An explanation of this transition is provided based on the collapsing phenomenon discovered in the experiments. ? The Institution of Engineering and Technology 2014.; EI; 10; 655-659; 9
语种	英语
DOI标识	10.1049/mnl.2014.0260
内容类型	其他
源URL	[http://ir.pku.edu.cn/handle/20.500.11897/461498]
专题	信息科学技术学院
推荐引用方式 GB/T 7714	Su, Zongming,Zhang, Xiao-Sheng,Hu, Wei,et al. Fabrication of silicon hierarchical nanopillar arrays based on nanosphere lithography. 2014-01-01.

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