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	The sacrificial Layer Releasing Of Micro-Machined Optical-fiber Switch With Poly-si Torsion Mirror; The sacrificial Layer Releasing Of Micro-Machined Optical-fiber Switch With Poly-si Torsion Mirror
	Shimei Liu ; Lin Wu ; Guobing Zhang ; Peiyu Zhang ; Dacheng Zhang ; Yilong Hao ; Ting Li
	2001
关键词	Mirror mirror switch etching satisfactory machined torsion wafer suspended resolve Mirror mirror switch etching satisfactory machined torsion wafer suspended resolve
英文摘要	Wet etching process is often used in the sacrificial layer releasing of micro-machined opticalfiber switch with poly-si torsion mirror.After the sacrificial layer releasing and during wafer drying, however,the surface tension of the flowing liquid produces pulling forces on suspended structure wh...; Wet etching process is often used in the sacrificial layer releasing of micro-machined opticalfiber switch with poly-si torsion mirror.After the sacrificial layer releasing and during wafer drying, however,the surface tension of the flowing liquid produces pulling forces on suspended structure wh...; Chinese Institute of Electronics(CIE)、IEEE Beijing Section; 4; Vol.2
语种	英语
内容类型	其他
源URL	[http://ir.pku.edu.cn/handle/20.500.11897/450503]
专题	信息科学技术学院
推荐引用方式 GB/T 7714	Shimei Liu,Lin Wu,Guobing Zhang,et al. The sacrificial Layer Releasing Of Micro-Machined Optical-fiber Switch With Poly-si Torsion Mirror, The sacrificial Layer Releasing Of Micro-Machined Optical-fiber Switch With Poly-si Torsion Mirror. 2001-01-01.

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