Fabrication of annular photonic crystals by atomic layer deposition and   sacrificial etching

doi:10.1116/1.3079662

CORC > 北京大学 > 信息科学技术学院

	Fabrication of annular photonic crystals by atomic layer deposition and sacrificial etching
	Feng, Junbo ; Chen, Yao ; Blair, John ; Kurt, Hamza ; Hao, Ran ; Citrin, D. S. ; Summers, Christopher J. ; Zhou, Zhiping
刊名	journal of vacuum science technology b
	2009
DOI	10.1116/1.3079662
英文摘要	In this article, the fabrication process of annular photonic crystals on silicon-on-insulator wafers was addressed for the first time. A self-alignment procedure for nanofabrication using atomic layer deposition and sacrificial etching was established to place accurately nanosized dielectric rods in nanosized circular air holes. Avoiding the challenging electron-beam lithography alignment, this method achieves atomic level precision and shows high stability. (C) 2009 American Vacuum Society. [DO]: 10.1116/1.3079662]; Engineering, Electrical & Electronic; Nanoscience & Nanotechnology; Physics, Applied; SCI(E); EI; 14; ARTICLE; 2; 568-572; 27
语种	英语
内容类型	期刊论文
源URL	[http://ir.pku.edu.cn/handle/20.500.11897/396662]
专题	信息科学技术学院
推荐引用方式 GB/T 7714	Feng, Junbo,Chen, Yao,Blair, John,et al. Fabrication of annular photonic crystals by atomic layer deposition and sacrificial etching[J]. journal of vacuum science technology b,2009.
APA	Feng, Junbo.,Chen, Yao.,Blair, John.,Kurt, Hamza.,Hao, Ran.,...&Zhou, Zhiping.(2009).Fabrication of annular photonic crystals by atomic layer deposition and sacrificial etching.journal of vacuum science technology b.
MLA	Feng, Junbo,et al."Fabrication of annular photonic crystals by atomic layer deposition and sacrificial etching".journal of vacuum science technology b (2009).