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	Monte Carlo Simulation of Cu-Resistivity
	Yan, Wang Zhuo ; Gang, Du ; Feng, Kang Jin ; Yan, Liu Xiao ; Ruqi, Han
	2008
关键词	Cu-resistivity gain boundary scattering Monte Carlo simutlation surface roughness scattering ELECTRON-SCATTERING TRANSPORT
英文摘要	We have developed an optimized model for electron behavior in Cu-line and we have implemented it using Monte Carlo method. Our model takes into account not only four normal scatterings but also the grain boundary scattering and the surface roughness scattering. The model has been tested with different line width and providing a good agreement with both calculated results and ITRS data.; Engineering, Electrical & Electronic; Physics, Applied; CPCI-S(ISTP); 0
语种	英语
内容类型	其他
源URL	[http://ir.pku.edu.cn/handle/20.500.11897/293708]
专题	信息科学技术学院
推荐引用方式 GB/T 7714	Yan, Wang Zhuo,Gang, Du,Feng, Kang Jin,et al. Monte Carlo Simulation of Cu-Resistivity. 2008-01-01.

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