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	In-situ measurement of ion angular distribution in bulk titanium DRIE for modeling the etch profile
	Hu, Jia ; He, Shuwei ; Zhang, Yiming ; Chen, Jing
	2013
关键词	IAD SU-8 overhang stiction DRIE model
英文摘要	The bulk titanium deep reactive ion etching (DRIE) enabled high aspect ratio structures and devices are promising for harsh and in vivo environments applications. An etching model is necessary for better profile control to acquire needed performance, in which a correct ion angular distribution (IAD) in chlorine plasma is crucial. In this paper, an overhang SU-8 structure is proposed to experimentally in-situ measure the IAD by analyzing the etching profiles. With these data, a profile evolution model is developed to predict the titanium DRIE process.; http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcApp=PARTNER_APP&SrcAuth=LinksAMR&KeyUT=WOS:000327183000067&DestLinkType=FullRecord&DestApp=ALL_WOS&UsrCustomerID=8e1609b174ce4e31116a60747a720701 ; Engineering, Biomedical; Engineering, Electrical & Electronic; Nanoscience & Nanotechnology; EI; CPCI-S(ISTP); 0
语种	英语
DOI标识	10.1109/NEMS.2013.6559744
内容类型	其他
源URL	[http://ir.pku.edu.cn/handle/20.500.11897/292564]
专题	信息科学技术学院
推荐引用方式 GB/T 7714	Hu, Jia,He, Shuwei,Zhang, Yiming,et al. In-situ measurement of ion angular distribution in bulk titanium DRIE for modeling the etch profile. 2013-01-01.

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