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Investigation of PECVD SiC nano film
Zhe, Chen ; Dayu, Tian ; Guobing, Zhang ; Haixia, Zhang
2007
英文摘要PECVD SiC nano thin films have been investigated. The element component was controlled by gas resources and residual stress was controlled by furnace annealing. The results of XRD, HRTEM measured show formation of SiC nano crystalline structure through a structure re-ordering by laser annealing, and the performance of PECVD SiC film is ameliorated with the nano crystalline. The nanoindentation test shows the SiCs hardness and Young's modulus has been Improved. The resistant of SiC thin Alms has been reduced effectively by in-situ doped together with laser annealing. ? 2007 IEEE.; EI; 0
语种英语
DOI标识10.1109/NANO.2007.4601373
内容类型其他
源URL[http://ir.pku.edu.cn/handle/20.500.11897/153654]  
专题信息科学技术学院
推荐引用方式
GB/T 7714
Zhe, Chen,Dayu, Tian,Guobing, Zhang,et al. Investigation of PECVD SiC nano film. 2007-01-01.
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