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Effect of doping SiO2 and applying high magnetic field during the film growth on structure and magnetic properties of evaporated Fe films
Liu, SY; Ma, YH; Chang, L; Li, GJ; Wang, JH; Wang, Q; Li, GJ (reprint author), Northeastern Univ, Minist Educ, Key Lab Electromagnet Proc Mat, Shenyang 110819, Liaoning, Peoples R China.
刊名THIN SOLID FILMS
2018-04-01
卷号651页码:1-6
关键词Tunneling Giant Magnetoresistance Fe-sio2 Granular Films Nanoparticles
ISSN号0040-6090
英文摘要Huge difference of surface energies between dielectric and metal provides an effective method to tune the structure and magnetic properties of films. Due to the difference of surface energies between SiO2 and Fe, dopant of SiO2 with 3.6% in atomic ratio in Fe film transforms the strip and column structure in the Fe films to equiaxed crystal formed by nanoparticles of the Fe-SiO2 films. Zeeman energy of applying high magnetic field (HMF) during film growth increases Fe atomic aggregation and atomic diffusion of SiO2 into the grain boundary. This leads to the improvement of the particle size with applying HMF during the film growth. These structural evolutions have a significant effect on the performance of the films. After the dopant of SiO2, the saturation magnetization M-s of the Fe-SiO2 film (324.6 kA/m) is 73.2% less than that of the Fe films. The coercivity H-c decreases 204.0% to 788.04 A/m. However, the Ms increases 44.3% and the H-c increases 27.4% for the Fe-SiO2 film with applying HMF during the film growth.; Huge difference of surface energies between dielectric and metal provides an effective method to tune the structure and magnetic properties of films. Due to the difference of surface energies between SiO2 and Fe, dopant of SiO2 with 3.6% in atomic ratio in Fe film transforms the strip and column structure in the Fe films to equiaxed crystal formed by nanoparticles of the Fe-SiO2 films. Zeeman energy of applying high magnetic field (HMF) during film growth increases Fe atomic aggregation and atomic diffusion of SiO2 into the grain boundary. This leads to the improvement of the particle size with applying HMF during the film growth. These structural evolutions have a significant effect on the performance of the films. After the dopant of SiO2, the saturation magnetization M-s of the Fe-SiO2 film (324.6 kA/m) is 73.2% less than that of the Fe films. The coercivity H-c decreases 204.0% to 788.04 A/m. However, the Ms increases 44.3% and the H-c increases 27.4% for the Fe-SiO2 film with applying HMF during the film growth.
学科主题Materials Science, Multidisciplinary ; Materials Science, Coatings & Films ; Physics, Applied ; Physics, Condensed Matter
语种英语
资助机构National Natural Science Foundation of China [51425401]; Fundamental Research Funds for the Central Universities [N160905001, N160907001]
公开日期2018-06-05
内容类型期刊论文
源URL[http://ir.imr.ac.cn/handle/321006/79408]  
专题金属研究所_中国科学院金属研究所
通讯作者Li, GJ (reprint author), Northeastern Univ, Minist Educ, Key Lab Electromagnet Proc Mat, Shenyang 110819, Liaoning, Peoples R China.
推荐引用方式
GB/T 7714
Liu, SY,Ma, YH,Chang, L,et al. Effect of doping SiO2 and applying high magnetic field during the film growth on structure and magnetic properties of evaporated Fe films[J]. THIN SOLID FILMS,2018,651:1-6.
APA Liu, SY.,Ma, YH.,Chang, L.,Li, GJ.,Wang, JH.,...&Li, GJ .(2018).Effect of doping SiO2 and applying high magnetic field during the film growth on structure and magnetic properties of evaporated Fe films.THIN SOLID FILMS,651,1-6.
MLA Liu, SY,et al."Effect of doping SiO2 and applying high magnetic field during the film growth on structure and magnetic properties of evaporated Fe films".THIN SOLID FILMS 651(2018):1-6.
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