In situ study on the thermal stability and interfaces properties of Er2O3/Al2O3/Si multi stacked films by X-ray photoelectron spectroscopy

doi:10.1016/j.spmi.2017.02.050

	In situ study on the thermal stability and interfaces properties of Er2O3/Al2O3/Si multi stacked films by X-ray photoelectron spectroscopy
	Ablat, A; Ibrahim, K; Wang, JO; Liu, C; Zhao, JL; Zhao JL(赵佳丽); Liu C(刘晨); Wang JO(王嘉鸥); Mamat, M; Kui RX(奎热西)
刊名	SUPERLATTICES AND MICROSTRUCTURES
	2017
卷号	104 页码:415-421
关键词	High-k dielectric PLD Er2O3 XPS
ISSN号	0749-6036
DOI	10.1016/j.spmi.2017.02.050
文献子类	Article
英文摘要	Ultrathin high-k dielectric films with Er2O3/Al2O3/Si structure were fabricated by the pulsed laser deposition (PLD) technique. The samples were annealed in O-2 ambient at the various temperatures. The interface reaction, and as well as the thermal stability between Si substrate and Er2O3 layer were studied in situ using X-ray photoelectron spectroscopy (XPS). The Film thickness was measured with scanning electron microscope (SEM). The experimental results indicate that the thickness of the silicate layer lessening at the interface with increasing of the thickness of Al2O3, and the production of the SiOx and the silicide is more easily formed than Er-silicate after annealing at the lower temperature because of the similarity of the structure and the small lattice mismatch. (C) 2017 Elsevier Ltd. All rights reserved.
WOS关键词	GATE DIELECTRICS ; THIN-FILMS ; SI(100)
WOS研究方向	Physics
语种	英语
WOS记录号	WOS:000400536000047
内容类型	期刊论文
源URL	[http://ir.ihep.ac.cn/handle/311005/284932]
专题	高能物理研究所_多学科研究中心高能物理研究所_粒子天体物理中心
作者单位	中国科学院高能物理研究所
推荐引用方式 GB/T 7714	Ablat, A,Ibrahim, K,Wang, JO,et al. In situ study on the thermal stability and interfaces properties of Er2O3/Al2O3/Si multi stacked films by X-ray photoelectron spectroscopy[J]. SUPERLATTICES AND MICROSTRUCTURES,2017,104:415-421.
APA	Ablat, A.,Ibrahim, K.,Wang, JO.,Liu, C.,Zhao, JL.,...&Ghupur, Y.(2017).In situ study on the thermal stability and interfaces properties of Er2O3/Al2O3/Si multi stacked films by X-ray photoelectron spectroscopy.SUPERLATTICES AND MICROSTRUCTURES,104,415-421.
MLA	Ablat, A,et al."In situ study on the thermal stability and interfaces properties of Er2O3/Al2O3/Si multi stacked films by X-ray photoelectron spectroscopy".SUPERLATTICES AND MICROSTRUCTURES 104(2017):415-421.