The optical and electrical properties of ZnO:Al thin films deposited at low temperatures by RF magnetron sputtering

doi:10.1016/j.ceramint.2017.11.216

CORC > 光电技术研究所 > 中国科学院光电技术研究所 > 微细加工光学技术国家重点实验室（开放室）

	The optical and electrical properties of ZnO:Al thin films deposited at low temperatures by RF magnetron sputtering
	Tang, Ping 1,2; Li, Bing 2; Feng, Lianghuan 2
刊名	CERAMICS INTERNATIONAL
	2018-03-01
卷号	44 期号:4 页码:4154-4157
关键词	ZnO:Al films Magnetron sputtering Low substrate temperatures
ISSN号	0272-8842
DOI	10.1016/j.ceramint.2017.11.216
文献子类	J
英文摘要	Several ZnO:Al thin films have been successfully deposited on glass substrates at different substrate temperatures by RF (radio frequency) magnetron sputtering method. Effects of the substrate temperatures on the optical and electrical properties of these ZnO:Al thin films were investigated. The UV-VIS-NIR spectra of the ZnO:Al thin films revealed that the average optical transmittances in the visible range are very high, up to 88%. X-ray diffraction results showed that crystallization of these films was improved at higher substrate temperature. The band gaps of ZnO:Al thin films deposited at 25 degrees C, 150 degrees C, 200 degrees C, and 250 degrees C are 3.59 eV, 3.55 eV, 3.53 eV, and 3.48 eV, respectively. The Hall-effect measurement demonstrated that the electrical resistivity of the films decreased with the increase of the substrate temperature and the electrical resistivity reached 1.990 x 10(-3) Omega cm at 250 degrees C.
WOS关键词	PULSED-LASER DEPOSITION ; SURFACE ; GLASS
语种	英语
WOS记录号	WOS:000424716200083
内容类型	期刊论文
源URL	[http://ir.ioe.ac.cn/handle/181551/9269]
专题	光电技术研究所_微细加工光学技术国家重点实验室（开放室）
作者单位	1.State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Chinese Academy of Sciences, P.O. Box 350, Chengdu; 610209, China; 2.College of Materials Science and Engineering, Sichuan University, Chengdu; 610064, China
推荐引用方式 GB/T 7714	Tang, Ping,Li, Bing,Feng, Lianghuan. The optical and electrical properties of ZnO:Al thin films deposited at low temperatures by RF magnetron sputtering[J]. CERAMICS INTERNATIONAL,2018,44(4):4154-4157.
APA	Tang, Ping,Li, Bing,&Feng, Lianghuan.(2018).The optical and electrical properties of ZnO:Al thin films deposited at low temperatures by RF magnetron sputtering.CERAMICS INTERNATIONAL,44(4),4154-4157.
MLA	Tang, Ping,et al."The optical and electrical properties of ZnO:Al thin films deposited at low temperatures by RF magnetron sputtering".CERAMICS INTERNATIONAL 44.4(2018):4154-4157.