In Situ Epitaxial Growth of Triangular CdS Nanoplates on Mica by Dip-Pen Nanolithography

doi:10.1021/jp807746g

CORC > 化学研究所 > 中国科学院化学研究所

	In Situ Epitaxial Growth of Triangular CdS Nanoplates on Mica by Dip-Pen Nanolithography
	Chu, Haibin 1; Ding, Lei 1; Wang, Jinyong 1; Li, Xuemei 1; You, Liping 2; Li, Yan 1
刊名	JOURNAL OF PHYSICAL CHEMISTRY C
	2008-12-04
卷号	112 期号:48 页码:18938-18942
ISSN号	1932-7447
DOI	10.1021/jp807746g
英文摘要	Epitaxial growth of triangular US nanoplates by dip-pen nanolithography is achieved on a mica substrate. This method offers in situ initiating, controlling, and monitoring of the epitaxial growth of triangular CdS plates in nanoscale. Control experiments and structure analysis indicate that both the tip-modulated crystallization and matching in the crystal structures (symmetry and lattice) of US and mica play key roles in the epitaxial growth of well-crystallized US nanostructures.
语种	英语
出版者	AMER CHEMICAL SOC
WOS记录号	WOS:000261218400036
内容类型	期刊论文
源URL	[http://ir.iccas.ac.cn/handle/121111/63921]
专题	中国科学院化学研究所
通讯作者	Li, Yan
作者单位	1.Coll Chem & Mol Engn, Natl Lab Rare Earth Mat Chem & Applicat, Key Lab Phys & Chem Nanodevices, Beijing Natl Lab Mol Sci, Beijing 100871, Peoples R China 2.Peking Univ, Electron Microscopy Lab, Beijing 100871, Peoples R China
推荐引用方式 GB/T 7714	Chu, Haibin,Ding, Lei,Wang, Jinyong,et al. In Situ Epitaxial Growth of Triangular CdS Nanoplates on Mica by Dip-Pen Nanolithography[J]. JOURNAL OF PHYSICAL CHEMISTRY C,2008,112(48):18938-18942.
APA	Chu, Haibin,Ding, Lei,Wang, Jinyong,Li, Xuemei,You, Liping,&Li, Yan.(2008).In Situ Epitaxial Growth of Triangular CdS Nanoplates on Mica by Dip-Pen Nanolithography.JOURNAL OF PHYSICAL CHEMISTRY C,112(48),18938-18942.
MLA	Chu, Haibin,et al."In Situ Epitaxial Growth of Triangular CdS Nanoplates on Mica by Dip-Pen Nanolithography".JOURNAL OF PHYSICAL CHEMISTRY C 112.48(2008):18938-18942.