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Growth mode and strain relaxation of inas on inp (111)a grown by molecular beam epitaxy
Li, HX; Daniels-Race, T; Wang, ZG
刊名Applied physics letters
1999-03-08
卷号74期号:10页码:1388-1390
ISSN号0003-6951
通讯作者Li, hx(hxli@ee.duke.edu)
英文摘要Growth mode and strain relaxation of molecular-beam-epitaxy grown inas/inalas/inp (111)a system have been investigated using reflection high-energy electron diffraction, transmission electron microscopy, atomic force microscopy, and photoluminescence measurements. in direct contrast to the well-studied inas/gaas system, our experimental results show that the inas grown on inalas/inp (111)a follows the stranski-krastanov mode. both self-organized inas quantum dots and relaxed inas islands are formed depending on the inas coverage. intense luminescence signals from both the inas quantum dots and wetting layer are observed. the luminescence efficiency of (111)a samples is comparable to that of (001) samples, suggesting the feasibility of fabricating quantum dot optoelectronic devices on inp (111)a surfaces. (c) 1999 american institute of physics. [s0003-6951(99)01010-4].
WOS关键词MICROSTRUCTURAL EVOLUTION ; ISLAND FORMATION ; INXGA1-XAS ; SI(100) ; GAAS ; GE
WOS研究方向Physics
WOS类目Physics, Applied
语种英语
出版者AMER INST PHYSICS
WOS记录号WOS:000079011500012
内容类型期刊论文
URI标识http://www.corc.org.cn/handle/1471x/2428753
专题半导体研究所
通讯作者Li, HX
作者单位1.Duke Univ, Dept Elect & Comp Engn, Durham, NC 27708 USA
2.Chinese Acad Sci, Inst Semicond, Lab Semicond Mat Sci, Beijing 100083, Peoples R China
推荐引用方式
GB/T 7714
Li, HX,Daniels-Race, T,Wang, ZG. Growth mode and strain relaxation of inas on inp (111)a grown by molecular beam epitaxy[J]. Applied physics letters,1999,74(10):1388-1390.
APA Li, HX,Daniels-Race, T,&Wang, ZG.(1999).Growth mode and strain relaxation of inas on inp (111)a grown by molecular beam epitaxy.Applied physics letters,74(10),1388-1390.
MLA Li, HX,et al."Growth mode and strain relaxation of inas on inp (111)a grown by molecular beam epitaxy".Applied physics letters 74.10(1999):1388-1390.
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