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Thermal diffusion of nitrogen into zno film deposited on inn/sapphire substrate by metal organic chemical vapor deposition
Shi, K.; Zhang, P. F.; Wei, H. Y.; Jiao, C. M.; Jin, P.; Liu, X. L.; Yang, S. Y.; Zhu, Q. S.; Wang, Z. G.
刊名Journal of applied physics
2011-12-01
卷号110期号:11页码:4
ISSN号0021-8979
DOI10.1063/1.3665203
通讯作者Shi, k.(shikai@semi.ac.cn)
英文摘要Zno film with high crystal quality was prepared on inn/sapphire substrate by metal organic chemical vapor deposition. the diffusion of nitrogen (n) into zno film was investigated via auger electron spectroscopy (aes), x-ray photoelectron spectroscopy (xps), and low-temperature photoluminescence (lt-pl). aes revealed that some n atoms out-diffused into zno film after a rapid thermal annealing (rta) process, while most of the in atoms remained in inn layers, which was confirmed by xps. lt-pl spectra at 10k further confirmed that n atoms diffused into the upper zno film and acted as acceptors after rta. it might be an attractive way to obtain high-quality p-type zno: n on inn films by this thermal diffusion doping technique. (c) 2011 american institute of physics. [doi:10.1063/1.3665203]
WOS关键词N-DOPED ZNO ; PHASE EPITAXY ; BOUND-EXCITON ; THIN-FILMS
WOS研究方向Physics
WOS类目Physics, Applied
语种英语
出版者AMER INST PHYSICS
WOS记录号WOS:000298254800030
内容类型期刊论文
URI标识http://www.corc.org.cn/handle/1471x/2428297
专题半导体研究所
通讯作者Shi, K.
作者单位Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
推荐引用方式
GB/T 7714
Shi, K.,Zhang, P. F.,Wei, H. Y.,et al. Thermal diffusion of nitrogen into zno film deposited on inn/sapphire substrate by metal organic chemical vapor deposition[J]. Journal of applied physics,2011,110(11):4.
APA Shi, K..,Zhang, P. F..,Wei, H. Y..,Jiao, C. M..,Jin, P..,...&Wang, Z. G..(2011).Thermal diffusion of nitrogen into zno film deposited on inn/sapphire substrate by metal organic chemical vapor deposition.Journal of applied physics,110(11),4.
MLA Shi, K.,et al."Thermal diffusion of nitrogen into zno film deposited on inn/sapphire substrate by metal organic chemical vapor deposition".Journal of applied physics 110.11(2011):4.
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