CORC  > 半导体研究所
Gap states and microstructure of microcrystalline silicon thin films
Peng Wen-Bo1; Liu Shi-Yong1; Xiao Hai-Bo1; Zhang Chang-Sha1; Shi Ming-Ji1; Zeng Xiang-Bo1; Xu Yan-Yue2; Kong Guang-Lin1; Yu Yu-De1
刊名Acta physica sinica
2009-08-01
卷号58期号:8页码:5716-5720
关键词Gap states Grain boundary Microcrystalline silicon Modulated photocurrent
ISSN号1000-3290
通讯作者Zeng xiang-bo(xbzeng@semi.ac.cn)
英文摘要The density of states (dos) above fermi level of hydrogenated microcrystalline silicon (mu c-si:h) films is correlated to the material microstructure. we use raman scattering and infrared absorption spectra to characterize the structure of the films made with different hydrogen dilution ratios. the dos of the films is examined by modulated photocurrent measurement. the results have been accounted for in the framework of a three-phase model comprised of amorphous and crystalline components, with the grain boundary as the third phase. we observed that the dos increases monotonically as the grain boundary volume fractions f(gb) is increased, which indicates a positive correlation between the dos and the grain boundary volume fraction.
WOS关键词A-SI-H ; SOLAR-CELLS ; HYDROGEN DILUTION ; LIGHT-SCATTERING ; TRANSITION FILMS ; RAMAN ; TEMPERATURE ; DEPOSITION ; CRYSTALLINE ; STABILITY
WOS研究方向Physics
WOS类目Physics, Multidisciplinary
语种英语
出版者CHINESE PHYSICAL SOC
WOS记录号WOS:000269228600090
内容类型期刊论文
URI标识http://www.corc.org.cn/handle/1471x/2427585
专题半导体研究所
通讯作者Zeng Xiang-Bo
作者单位1.Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
2.China Agr Univ, Dept Appl Phys, Beijing 100083, Peoples R China
推荐引用方式
GB/T 7714
Peng Wen-Bo,Liu Shi-Yong,Xiao Hai-Bo,et al. Gap states and microstructure of microcrystalline silicon thin films[J]. Acta physica sinica,2009,58(8):5716-5720.
APA Peng Wen-Bo.,Liu Shi-Yong.,Xiao Hai-Bo.,Zhang Chang-Sha.,Shi Ming-Ji.,...&Yu Yu-De.(2009).Gap states and microstructure of microcrystalline silicon thin films.Acta physica sinica,58(8),5716-5720.
MLA Peng Wen-Bo,et al."Gap states and microstructure of microcrystalline silicon thin films".Acta physica sinica 58.8(2009):5716-5720.
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