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Diamond nucleation by energetic pure carbon bombardment
Yao, Y; Liao, MY; Kohler, T; Frauenheim, T; Zhang, RQ; Wang, ZG; Lifshitz, Y; Lee, ST
刊名Physical review b
2005-07-01
卷号72期号:3页码:5
ISSN号1098-0121
DOI10.1103/physrevb.72.035402
通讯作者Yao, y()
英文摘要Deposition of 1000 ev pure carbon ions onto si(001) held at 800 degrees c led to direct nucleation of diamond crystallites, as proven by high-resolution transmission electron microscopy and electron energy loss spectroscopy. molecular dynamic simulations show that diamond nucleation in the absence of hydrogen can occur by precipitation of diamond clusters in a dense amorphous carbon matrix generated by subplantation. once the diamond clusters are formed, they can grow by thermal annealing consuming carbon atoms from the amorphous matrix. the results are applicable to other materials as well.
WOS关键词ION-BEAM DEPOSITION ; ELECTRONIC-PROPERTIES ; SUBPLANTATION MODEL ; AMORPHOUS-CARBON ; FILM GROWTH ; MECHANISM ; SILICON
WOS研究方向Physics
WOS类目Physics, Condensed Matter
语种英语
出版者AMERICAN PHYSICAL SOC
WOS记录号WOS:000230890200146
内容类型期刊论文
URI标识http://www.corc.org.cn/handle/1471x/2426428
专题半导体研究所
通讯作者Yao, Y
作者单位1.City Univ Hong Kong, Ctr Super Diamond & Adv Films, Hong Kong, Hong Kong, Peoples R China
2.City Univ Hong Kong, Dept Phys & Mat Sci, Hong Kong, Hong Kong, Peoples R China
3.Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
4.Univ Paderborn, Dept Phys, D-33098 Paderborn, Germany
5.Chinese Acad Sci, Tech Inst Phys & Chem, Nanoorgan Photoelect Lab, Beijing 100101, Peoples R China
6.Technion Israel Inst Technol, Dept Mat Engn, IL-32000 Haifa, Israel
推荐引用方式
GB/T 7714
Yao, Y,Liao, MY,Kohler, T,et al. Diamond nucleation by energetic pure carbon bombardment[J]. Physical review b,2005,72(3):5.
APA Yao, Y.,Liao, MY.,Kohler, T.,Frauenheim, T.,Zhang, RQ.,...&Lee, ST.(2005).Diamond nucleation by energetic pure carbon bombardment.Physical review b,72(3),5.
MLA Yao, Y,et al."Diamond nucleation by energetic pure carbon bombardment".Physical review b 72.3(2005):5.
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