10 A/567 V normally off p-GaN gate HEMT with high-threshold voltage and low-gate leakage current | |
Wang, Qilong; Zhang, Bingliang; Du, Zhongkai; Zhao, Jie(赵杰); Chen, Fu(陈扶); Song, Liang(宋亮); Fu, Kai(付凯); Wu, Dongdong(吴冬东); Hao, Ronghui(郝荣晖); Zhang, Baoshun(张宝顺) | |
刊名 | ELECTRONICS LETTERS |
2018 | |
其他题名 | 10 A/567 V normally off p-GaN gate HEMT with high-threshold voltage and low-gate leakage current |
语种 | 英语 |
内容类型 | 期刊论文 |
源URL | [http://ir.sinano.ac.cn/handle/332007/6238] |
专题 | 苏州纳米技术与纳米仿生研究所_纳米加工公共平台 |
作者单位 | 中国科学院苏州纳米技术与纳米仿生研究所 |
推荐引用方式 GB/T 7714 | Wang, Qilong,Zhang, Bingliang,Du, Zhongkai,et al. 10 A/567 V normally off p-GaN gate HEMT with high-threshold voltage and low-gate leakage current[J]. ELECTRONICS LETTERS,2018. |
APA | Wang, Qilong.,Zhang, Bingliang.,Du, Zhongkai.,Zhao, Jie.,Chen, Fu.,...&Yu, Guohao.(2018).10 A/567 V normally off p-GaN gate HEMT with high-threshold voltage and low-gate leakage current.ELECTRONICS LETTERS. |
MLA | Wang, Qilong,et al."10 A/567 V normally off p-GaN gate HEMT with high-threshold voltage and low-gate leakage current".ELECTRONICS LETTERS (2018). |
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