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	退火处理对W:Bi4Ge3O12和Bi12GeO20晶体发光性能的影响
	Yu, Ping-Sheng[1]; Su, Liang-Bi[2]; Tang, Hui-Li[3]; Guo, Xin[4]; Zhao, Heng-Yu[5]; Yang, Qiu-Hong[6]; Xu, Jun[7]
刊名	发光学报
	2011
卷号	32页码:825-829
关键词	光致发光 退火
ISSN号	1000-7032
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/2307049
专题	上海大学
作者单位	[1]School of Materials Science and Engineering, Shanghai University, Shanghai 200072, China |Key Laboratory of Transparent and Opto Functional Inorganic Materials, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 201800, China[2]Key Laboratory of Transparent and Opto Functional Inorganic Materials, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 201800, China[3]Key Laboratory of Transparent and Opto Functional Inorganic Materials, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 201800, China[4]Key Laboratory of Transparent and Opto Functional Inorganic Materials, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 201800, China[5]School of Materials Science and Engineering, Shanghai University, Shanghai 200072, China |Key Laboratory of Transparent and Opto Functional Inorganic Materials, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 201800, China[6]School of Materials Science and Engineering, Shanghai University, Shanghai 200072, China [7]Key Laboratory of Transparent and Opto Functional Inorganic Materials, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 201800, China
推荐引用方式 GB/T 7714	Yu, Ping-Sheng[1],Su, Liang-Bi[2],Tang, Hui-Li[3],等. 退火处理对W:Bi4Ge3O12和Bi12GeO20晶体发光性能的影响[J]. 发光学报,2011,32:825-829.
APA	Yu, Ping-Sheng[1].,Su, Liang-Bi[2].,Tang, Hui-Li[3].,Guo, Xin[4].,Zhao, Heng-Yu[5].,...&Xu, Jun[7].(2011).退火处理对W:Bi4Ge3O12和Bi12GeO20晶体发光性能的影响.发光学报,32,825-829.
MLA	Yu, Ping-Sheng[1],et al."退火处理对W:Bi4Ge3O12和Bi12GeO20晶体发光性能的影响".发光学报 32(2011):825-829.

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