QQ客服 官方微博 反馈留言

	Analysis of Wet Etching Characteristics of a-IGZO Thin Film
	Chen, Longlong[1]; Li, Xifeng[2]; Shi, Jifeng[3]; Zhang, Hao[4]; Li, Chunya[5]; Zhang, Jianhua[6]
	2012
会议名称	NEW MATERIALS AND PROCESSES, PTS 1-3
会议日期	2012-03-27
关键词	amorphous InGaZnO (a-IGZO) wet etching etching rate over etching
页码	2339-2343
URL标识	查看原文
内容类型	会议论文
URI标识	http://www.corc.org.cn/handle/1471x/2298562
专题	上海大学
作者单位	1.[1]Shanghai Univ, Minist Educ, Key Lab Adv Display & Syst Applicat, Shanghai 200072, Peoples R China. 2.[2]Shanghai Univ, Minist Educ, Key Lab Adv Display & Syst Applicat, Shanghai 200072, Peoples R China. 3.[3]Shanghai Univ, Minist Educ, Key Lab Adv Display & Syst Applicat, Shanghai 200072, Peoples R China. 4.[4]Shanghai Univ, Minist Educ, Key Lab Adv Display & Syst Applicat, Shanghai 200072, Peoples R China. 5.[5]Shanghai Univ, Minist Educ, Key Lab Adv Display & Syst Applicat, Shanghai 200072, Peoples R China. 6.[6]Shanghai Univ, Minist Educ, Key Lab Adv Display & Syst Applicat, Shanghai 200072, Peoples R China.
推荐引用方式 GB/T 7714	Chen, Longlong[1],Li, Xifeng[2],Shi, Jifeng[3],et al. Analysis of Wet Etching Characteristics of a-IGZO Thin Film[C]. 见:NEW MATERIALS AND PROCESSES, PTS 1-3. 2012-03-27.

个性服务

查看访问统计

相关权益政策

暂无数据

收藏/分享

除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。