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	Aluminum-induced crystalization of amorphous silicon films deposited by megnetron sputtering
	Qian, Jun[1]; Shi, Weimin[2]; Jin, Jing[3]; Li, Jirong[4]; Liao, Yang[5]
	2013
会议名称	MATERIAL DESIGN, PROCESSING AND APPLICATIONS, PARTS 1-4
会议日期	2013-03-30
关键词	Amorphous Si aluminum-induced crystallization Poly-silicon
页码	1655-1658
URL标识	查看原文
内容类型	会议论文
URI标识	http://www.corc.org.cn/handle/1471x/2290120
专题	上海大学
作者单位	1.[1]Shanghai Univ, Sch Mat Sci & Engn, Shanghai 200072, Peoples R China. 2.[2]Shanghai Univ, Sch Mat Sci & Engn, Shanghai 200072, Peoples R China. 3.[3]Shanghai Univ, Sch Mat Sci & Engn, Shanghai 200072, Peoples R China. 4.[4]Shanghai Univ, Sch Mat Sci & Engn, Shanghai 200072, Peoples R China. 5.[5]Shanghai Univ, Sch Mat Sci & Engn, Shanghai 200072, Peoples R China.
推荐引用方式 GB/T 7714	Qian, Jun[1],Shi, Weimin[2],Jin, Jing[3],et al. Aluminum-induced crystalization of amorphous silicon films deposited by megnetron sputtering[C]. 见:MATERIAL DESIGN, PROCESSING AND APPLICATIONS, PARTS 1-4. 2013-03-30.

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