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The effect of substrate temperature on high quality c-axis oriented AZO thin films prepared by DC reactive magnetron sputtering for photoelectric device applications
He, Bo[1]; Xu, Jing[2]; Xing, HuaiZhong[3]; Wang, ChunRui[4]; Zhang, XiaoDong[5]
刊名SUPERLATTICES AND MICROSTRUCTURES
2013
卷号64页码:319-330
关键词Al doped ZnO (AZO) DC reactive magnetron sputtering Structure Electrical properties Optical properties
ISSN号0749-6036
URL标识查看原文
内容类型期刊论文
URI标识http://www.corc.org.cn/handle/1471x/2289419
专题上海大学
作者单位1.[1]Donghua Univ, Dept Appl Phys, Shanghai 201620, Peoples R China.,Donghua Univ, State Key Lab Modificat Chem Fibers & Polymer Mat, Shanghai 201620, Peoples R China.
2.[2]Shanghai Univ, Instrumental Anal & Res Ctr, Shanghai 200444, Peoples R China.
3.[3]Donghua Univ, Dept Appl Phys, Shanghai 201620, Peoples R China.,Donghua Univ, State Key Lab Modificat Chem Fibers & Polymer Mat, Shanghai 201620, Peoples R China.
4.[4]Donghua Univ, Dept Appl Phys, Shanghai 201620, Peoples R China.,Donghua Univ, State Key Lab Modificat Chem Fibers & Polymer Mat, Shanghai 201620, Peoples R China.
5.[5]Donghua Univ, Dept Appl Phys, Shanghai 201620, Peoples R China.,Donghua Univ, State Key Lab Modificat Chem Fibers & Polymer Mat, Shanghai 201620, Peoples R China.
推荐引用方式
GB/T 7714
He, Bo[1],Xu, Jing[2],Xing, HuaiZhong[3],et al. The effect of substrate temperature on high quality c-axis oriented AZO thin films prepared by DC reactive magnetron sputtering for photoelectric device applications[J]. SUPERLATTICES AND MICROSTRUCTURES,2013,64:319-330.
APA He, Bo[1],Xu, Jing[2],Xing, HuaiZhong[3],Wang, ChunRui[4],&Zhang, XiaoDong[5].(2013).The effect of substrate temperature on high quality c-axis oriented AZO thin films prepared by DC reactive magnetron sputtering for photoelectric device applications.SUPERLATTICES AND MICROSTRUCTURES,64,319-330.
MLA He, Bo[1],et al."The effect of substrate temperature on high quality c-axis oriented AZO thin films prepared by DC reactive magnetron sputtering for photoelectric device applications".SUPERLATTICES AND MICROSTRUCTURES 64(2013):319-330.
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