The effect of substrate temperature on high quality c-axis oriented AZO thin films prepared by DC reactive magnetron sputtering for photoelectric device applications | |
He, Bo[1]; Xu, Jing[2]; Xing, HuaiZhong[3]; Wang, ChunRui[4]; Zhang, XiaoDong[5] | |
刊名 | SUPERLATTICES AND MICROSTRUCTURES |
2013 | |
卷号 | 64页码:319-330 |
关键词 | Al doped ZnO (AZO) DC reactive magnetron sputtering Structure Electrical properties Optical properties |
ISSN号 | 0749-6036 |
URL标识 | 查看原文 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/2289419 |
专题 | 上海大学 |
作者单位 | 1.[1]Donghua Univ, Dept Appl Phys, Shanghai 201620, Peoples R China.,Donghua Univ, State Key Lab Modificat Chem Fibers & Polymer Mat, Shanghai 201620, Peoples R China. 2.[2]Shanghai Univ, Instrumental Anal & Res Ctr, Shanghai 200444, Peoples R China. 3.[3]Donghua Univ, Dept Appl Phys, Shanghai 201620, Peoples R China.,Donghua Univ, State Key Lab Modificat Chem Fibers & Polymer Mat, Shanghai 201620, Peoples R China. 4.[4]Donghua Univ, Dept Appl Phys, Shanghai 201620, Peoples R China.,Donghua Univ, State Key Lab Modificat Chem Fibers & Polymer Mat, Shanghai 201620, Peoples R China. 5.[5]Donghua Univ, Dept Appl Phys, Shanghai 201620, Peoples R China.,Donghua Univ, State Key Lab Modificat Chem Fibers & Polymer Mat, Shanghai 201620, Peoples R China. |
推荐引用方式 GB/T 7714 | He, Bo[1],Xu, Jing[2],Xing, HuaiZhong[3],et al. The effect of substrate temperature on high quality c-axis oriented AZO thin films prepared by DC reactive magnetron sputtering for photoelectric device applications[J]. SUPERLATTICES AND MICROSTRUCTURES,2013,64:319-330. |
APA | He, Bo[1],Xu, Jing[2],Xing, HuaiZhong[3],Wang, ChunRui[4],&Zhang, XiaoDong[5].(2013).The effect of substrate temperature on high quality c-axis oriented AZO thin films prepared by DC reactive magnetron sputtering for photoelectric device applications.SUPERLATTICES AND MICROSTRUCTURES,64,319-330. |
MLA | He, Bo[1],et al."The effect of substrate temperature on high quality c-axis oriented AZO thin films prepared by DC reactive magnetron sputtering for photoelectric device applications".SUPERLATTICES AND MICROSTRUCTURES 64(2013):319-330. |
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