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	Influence of tilt moiré fringe on alignment accuracy in proximity lithography (EI收录)
	Zhu, Jiangping[1,2,3]; Hu, Song[1]; Yu, Junsheng[2]; Tang, Yan[1]; Xu, Feng[5]; He, Yu[1,3]; Zhou, Shaolin[4]; Li, Lanlan[1,3]
刊名	Optics and Lasers in Engineering
	2013
卷号	51页码:371-381
关键词	Electrical engineering Magnetic materials
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/2221982
专题	华南理工大学
作者单位	1.[1] Institution of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China 2.[2] School of Optoelectronic Information, University of Electronic Science and Technology of China, Chengdu 610054, China 3.[3] Graduate University of Chinese Academy of Sciences, Beijing 100039, China 4.[4] School of Electronic and Information, South China University of Technology, Guangzhou 510640, China 5.[5] Information Engineering College, Southwest University of Science and Technology, Mianyang 621010, China
推荐引用方式 GB/T 7714	Zhu, Jiangping[1,2,3],Hu, Song[1],Yu, Junsheng[2],等. Influence of tilt moiré fringe on alignment accuracy in proximity lithography (EI收录)[J]. Optics and Lasers in Engineering,2013,51:371-381.
APA	Zhu, Jiangping[1,2,3].,Hu, Song[1].,Yu, Junsheng[2].,Tang, Yan[1].,Xu, Feng[5].,...&Li, Lanlan[1,3].(2013).Influence of tilt moiré fringe on alignment accuracy in proximity lithography (EI收录).Optics and Lasers in Engineering,51,371-381.
MLA	Zhu, Jiangping[1,2,3],et al."Influence of tilt moiré fringe on alignment accuracy in proximity lithography (EI收录)".Optics and Lasers in Engineering 51(2013):371-381.

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