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	Epitaxial growth of homogeneous single-crystalline AlN films on single-crystalline Cu (1 1 1) substrates (EI收录)
	Wang, Wenliang[1]; Yang, Weijia[1]; Liu, Zuolian[1]; Lin, Yunhao[1]; Zhou, Shizhong[1]; Qian, Huirong[1]; Gao, Fangliang[1]; Yang, Hui[1]; Li, Guoqiang[1,2]
刊名	Applied Surface Science
	2014
卷号	294页码:1-8
关键词	Application programs Atomic force microscopy Copper Cracks Crystalline materials Epitaxial growth Field emission microscopes Pulsed laser deposition Spectroscopic ellipsometry Substrates Thick films Transmission electron microscopy X ray diffraction
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/2217042
专题	华南理工大学
作者单位	1.[1] State Key Laboratory of Luminescent Materials and Devices, South China University of Technology, Guangzhou 510640, China 2.[2] Department of Electronic Materials, School of Materials Science and Engineering, South China University of Technology, Guangzhou 510640, China
推荐引用方式 GB/T 7714	Wang, Wenliang[1],Yang, Weijia[1],Liu, Zuolian[1],等. Epitaxial growth of homogeneous single-crystalline AlN films on single-crystalline Cu (1 1 1) substrates (EI收录)[J]. Applied Surface Science,2014,294:1-8.
APA	Wang, Wenliang[1].,Yang, Weijia[1].,Liu, Zuolian[1].,Lin, Yunhao[1].,Zhou, Shizhong[1].,...&Li, Guoqiang[1,2].(2014).Epitaxial growth of homogeneous single-crystalline AlN films on single-crystalline Cu (1 1 1) substrates (EI收录).Applied Surface Science,294,1-8.
MLA	Wang, Wenliang[1],et al."Epitaxial growth of homogeneous single-crystalline AlN films on single-crystalline Cu (1 1 1) substrates (EI收录)".Applied Surface Science 294(2014):1-8.

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