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	A method to fabricate high-aspect-ratio microstructures using pmma photoresist
	Zhang, Tianchong; Yi, Futing; Wang, Bo; Liu, Jing; Wang, Yuting; Zhou, Yue
刊名	Microsystem technologies-micro-and nanosystems-information storage and processing systems
	2018-02-01
卷号	24期号:2页码:1223-1226
ISSN号	0946-7076
DOI	10.1007/s00542-017-3490-x
通讯作者	Zhang, tianchong(zhangtc@ihep.ac.cn)
英文摘要	Fabrications of high-aspect-ratio microstructures (harms) using negative photoresist have been studied a lot by researchers recently, but the removal of the resist is still a problem. we report a method to fabricate harms using pmma, a positive photoresist. a classical microstructure, densely packed micro square columns, was tried in our study. a top grid made of negative photoresists was employed to join all the separate parts together to prevent them from tilting or clumping. the development and electroplating processes were not influenced by the top grid. excellent nickel micro-pores-structures were obtained finally, demonstrating that the method is a promising way to fabricate harms especially when the resist needs to be removed.
WOS关键词	X-RAY-LITHOGRAPHY ; SU-8 PHOTORESIST ; REMOVAL ; RESIST
WOS研究方向	Engineering ; Science & Technology - Other Topics ; Materials Science ; Physics
WOS类目	Engineering, Electrical & Electronic ; Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary ; Physics, Applied
语种	英语
出版者	SPRINGER
WOS记录号	WOS:000423697800041
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/2177951
专题	高能物理研究所
通讯作者	Zhang, Tianchong
作者单位	Chinese Acad Sci, Inst High Energy Phys, 19B Yuquan Lu, Beijing 100049, Peoples R China
推荐引用方式 GB/T 7714	Zhang, Tianchong,Yi, Futing,Wang, Bo,et al. A method to fabricate high-aspect-ratio microstructures using pmma photoresist[J]. Microsystem technologies-micro-and nanosystems-information storage and processing systems,2018,24(2):1223-1226.
APA	Zhang, Tianchong,Yi, Futing,Wang, Bo,Liu, Jing,Wang, Yuting,&Zhou, Yue.(2018).A method to fabricate high-aspect-ratio microstructures using pmma photoresist.Microsystem technologies-micro-and nanosystems-information storage and processing systems,24(2),1223-1226.
MLA	Zhang, Tianchong,et al."A method to fabricate high-aspect-ratio microstructures using pmma photoresist".Microsystem technologies-micro-and nanosystems-information storage and processing systems 24.2(2018):1223-1226.

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