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Photoluminescence behavior and thermal stability of Eu-doped SiAlON thin films prepared by RF magnetron co-sputtering of SiAlON and Eu2O3 targets
Hou, Shaoke[1]; Liu, Qian[2]; Ni, Jia[3]; Liu, Guanghui[4]; Wan, Dongyun[5]
刊名FUNCTIONAL MATERIALS LETTERS
2018
卷号11
关键词Film co-sputtering SiAlON E2O3 photoluminescence valence stability
ISSN号1793-6047
URL标识查看原文
内容类型期刊论文
URI标识http://www.corc.org.cn/handle/1471x/2171693
专题上海大学
作者单位1.[1]Shanghai Univ, Sch Mat Sci & Engn, Shanghai 200444, Peoples R China.
2.Chinese Acad Sci, State Key Lab High Performance Ceram & Superfine, Shanghai Inst Ceram, Shanghai 200050, Peoples R China.,Shanghai Inst Mat Genome, 99 Shangda Rd, Shanghai 200444, Peoples R China.
3.[2]Chinese Acad Sci, State Key Lab High Performance Ceram & Superfine, Shanghai Inst Ceram, Shanghai 200050, Peoples R China.,Shanghai Inst Mat Genome, 99 Shangda Rd, Shanghai 200444, Peoples R China.
4.[3]Chinese Acad Sci, State Key Lab High Performance Ceram & Superfine, Shanghai Inst Ceram, Shanghai 200050, Peoples R China.,Shanghai Inst Mat Genome, 99 Shangda Rd, Shanghai 200444, Peoples R China.
5.Univ Chinese Acad Sci, Beijing 100039, Peoples R China.
6.[4]Chinese Acad Sci, State Key Lab High Performance Ceram & Superfine, Shanghai Inst Ceram, Shanghai 200050, Peoples R China.,Shanghai Inst Mat Genome, 99 Shangda Rd, Shanghai 200444, Peoples R China.
7.[5]Shanghai Univ, Sch Mat Sci & Engn, Shanghai 200444, Peoples R China.
推荐引用方式
GB/T 7714
Hou, Shaoke[1],Liu, Qian[2],Ni, Jia[3],et al. Photoluminescence behavior and thermal stability of Eu-doped SiAlON thin films prepared by RF magnetron co-sputtering of SiAlON and Eu2O3 targets[J]. FUNCTIONAL MATERIALS LETTERS,2018,11.
APA Hou, Shaoke[1],Liu, Qian[2],Ni, Jia[3],Liu, Guanghui[4],&Wan, Dongyun[5].(2018).Photoluminescence behavior and thermal stability of Eu-doped SiAlON thin films prepared by RF magnetron co-sputtering of SiAlON and Eu2O3 targets.FUNCTIONAL MATERIALS LETTERS,11.
MLA Hou, Shaoke[1],et al."Photoluminescence behavior and thermal stability of Eu-doped SiAlON thin films prepared by RF magnetron co-sputtering of SiAlON and Eu2O3 targets".FUNCTIONAL MATERIALS LETTERS 11(2018).
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