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	Measurements of Microstructural, Chemical, Optical, and Electrical Properties of Silicon-Oxygen-Nitrogen Films Prepared by Plasma-Enhanced Atomic Layer Deposition
	Ma, Hong-Ping[1]; Lu, Hong-Liang[2]; Yang, Jia-He[3]; Li, Xiao-Xi[4]; Wang, Tao[5]; Huang, Wei[6]; Yuan, Guang-Jie[7]; Komarov, Fadei F.[8]; Zhang, David Wei[9]
刊名	NANOMATERIALS
	2018
卷号	8页码:1-14
关键词	silicon nitride silicon oxynitride plasma enhanced atomic layer deposition oxygen contamination optical properties
ISSN号	2079-4991
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/2168236
专题	上海大学
作者单位	1.[1]Fudan Univ, Sch Microelect, Shanghai Inst Intelligent Elect & Syst, State Key Lab ASIC & Syst, Shanghai 200433, Peoples R China. 2.[2]Fudan Univ, Sch Microelect, Shanghai Inst Intelligent Elect & Syst, State Key Lab ASIC & Syst, Shanghai 200433, Peoples R China. 3.[3]Fudan Univ, Sch Microelect, Shanghai Inst Intelligent Elect & Syst, State Key Lab ASIC & Syst, Shanghai 200433, Peoples R China. 4.[4]Fudan Univ, Sch Microelect, Shanghai Inst Intelligent Elect & Syst, State Key Lab ASIC & Syst, Shanghai 200433, Peoples R China. 5.[5]Fudan Univ, Sch Microelect, Shanghai Inst Intelligent Elect & Syst, State Key Lab ASIC & Syst, Shanghai 200433, Peoples R China. 6.[6]Fudan Univ, Sch Microelect, Shanghai Inst Intelligent Elect & Syst, State Key Lab ASIC & Syst, Shanghai 200433, Peoples R China. 7.[7]Shanghai Univ, SMIT Ctr, Sch Automat & Mech Engn, Shanghai 201800, Peoples R China. 8.[8]Belarusian State Univ, AN Sevchenko Inst Appl Phys Problems, Minsk 220045, BELARUS. 9.[9]Fudan Univ, Sch Microelect, Shanghai Inst Intelligent Elect & Syst, State Key Lab ASIC & Syst, Shanghai 200433, Peoples R China.
推荐引用方式 GB/T 7714	Ma, Hong-Ping[1],Lu, Hong-Liang[2],Yang, Jia-He[3],et al. Measurements of Microstructural, Chemical, Optical, and Electrical Properties of Silicon-Oxygen-Nitrogen Films Prepared by Plasma-Enhanced Atomic Layer Deposition[J]. NANOMATERIALS,2018,8:1-14.
APA	Ma, Hong-Ping[1].,Lu, Hong-Liang[2].,Yang, Jia-He[3].,Li, Xiao-Xi[4].,Wang, Tao[5].,...&Zhang, David Wei[9].(2018).Measurements of Microstructural, Chemical, Optical, and Electrical Properties of Silicon-Oxygen-Nitrogen Films Prepared by Plasma-Enhanced Atomic Layer Deposition.NANOMATERIALS,8,1-14.
MLA	Ma, Hong-Ping[1],et al."Measurements of Microstructural, Chemical, Optical, and Electrical Properties of Silicon-Oxygen-Nitrogen Films Prepared by Plasma-Enhanced Atomic Layer Deposition".NANOMATERIALS 8(2018):1-14.

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